Hexagonal MEMS Diaphragm Stress Reduction
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Solution Overview
Problem
Conventional MEMS devices with square diaphragm structures face stress concentration issues at corners, leading to non-uniform vibration characteristics and increased chip size, which hinders miniaturization and cost reduction, and the Deep-RIE method is costly and reduces chip strength.
Innovation Solution
A diaphragm structure with a substantially hexagonal shape and interior angles greater than 90 degrees, using a (110) silicon substrate with vertical and inclined surfaces in the through-hole, and a rhombic chip shape to reduce stress concentration and chip size while maintaining sensitivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a square diaphragm structure is used in conventional MEMS devices, then the diaphragm can be easily fabricated using standard etching processes, but stress concentration occurs at the four corners causing non-uniform vibration characteristics and potential breakage
Solution Approach 1:
The patent applies curvature by replacing the square diaphragm shape with a rounded shape. The corner regions are smoothly curved to eliminate sharp angles, which distributes stress more uniformly across the diaphragm structure. This curvature modification eliminates the stress concentration points that cause non-uniform vibration and potential breakage in conventional square diaphragms.
Solution Approach 2:
The patent changes the geometric parameters of the diaphragm from a square configuration to a rounded configuration. By modifying the shape parameters (eliminating sharp corners and adjusting the overall geometry), the patent achieves more uniform stress distribution while maintaining ease of fabrication through standard etching processes.
2Manufacturing precision
If the chip size is increased to accommodate the diaphragm and (111) inclined portions, then the diaphragm can be fabricated with desired size, but the effective area ratio of diaphragm to chip area decreases
Solution Approach 1:
The rounded shape of the diaphragm allows for more efficient use of the available chip area. By eliminating the need for large (111) inclined portions that are required by square shapes, the rounded diaphragm can be fabricated within a smaller chip area, thereby increasing the effective area ratio.
Solution Approach 2:
The patent changes the diaphragm shape parameter from square to rounded, which fundamentally alters the geometric relationship between the diaphragm area and the required chip area. This parameter change enables the diaphragm to be fabricated with the same or larger area while occupying significantly less chip area, thus improving the area ratio.
3Manufacturing precision
If the (111) inclined surfaces are used in the through-hole structure, then anisotropic wet etching can be performed with good dimensional controllability, but the chip size increases due to the inclined portion width
Solution Approach 1:
The rounded diaphragm shape eliminates the need for large (111) inclined portions that are characteristic of square diaphragms. By using a rounded geometry, the patent reduces the width of the inclined portions while maintaining the benefits of anisotropic wet etching for dimensional controllability, thereby reducing the overall chip size.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces stress concentration, prevents diaphragm breakage, and improves the effective area ratio of the diaphragm to the chip area, enabling chip miniaturization and cost reduction while maintaining sensitivity.
Implementation Method 1
a diaphragm 304 vibrates depending on an acceleration or pressure variation, and thereby utilizing the diaphragm 304 for MEMS devices such as various sensors by electrically detecting such vibration displacement
Implementation Method 2
an acoustic sensor which has a diaphragm vibrating by detecting a pressure variation
Implementation Method 3
Anisotropic wet etching can be performed with a good dimensional controllability. As inner walls of the through-hole 302, (111) inclined surfaces 305 having an angle of 54.7 degrees with respect to the (100) plane
Data Source
AI summary
A diaphragm structure for a MEMS device includes a through-hole formed so as to penetrate from an upper surface to a bottom surface of a substrate; and a vibrating electrode film formed on the upper surface of the substrate so as to cover the through-hole. An opening shape of the through-hole in the upper surface of the substrate is substantially hexagonal.


