Hydrogenated Block Copolymer Polishing Pad for Stable Dressing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional polishing pads with styrene-based thermoplastic elastomers exhibit high friction coefficients, leading to instability during polishing processes, and thus cannot achieve a stable dressing and high polishing rates.
Innovation Solution
A polishing pad containing a hydrogenated block copolymer with specific vinyl aromatic and conjugated diene monomer units, formulated to have a static friction coefficient of 1.2 or less, which reduces stickiness and enhances stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a styrene-based thermoplastic elastomer is used in the polishing pad, then a high polishing rate can be realized, but the friction coefficient becomes high causing unstable dressing
Solution Approach 1:
The patent changes the chemical composition parameters of the elastomer by using hydrogenated block copolymer instead of conventional styrene-based thermoplastic elastomer. This parameter change reduces the friction coefficient while maintaining the high polishing rate capability, thereby resolving the contradiction between productivity and dressing stability.
Solution Approach 2:
The patent employs a composite elastomer system comprising hydrogenated block copolymer with specific monomer units (vinyl aromatic and conjugated diene). This composite material structure enables simultaneous achievement of low friction coefficient and high polishing rate, eliminating the instability issue while maintaining productivity.
2Reliability
If the friction coefficient is reduced to improve dressing stability, then the adhesion to the material may be compromised, but high polishing rate requires optimal friction characteristics
Solution Approach 1:
The patent optimizes the friction coefficient parameter by selecting hydrogenated block copolymer with specific monomer composition ratios. This parameter optimization achieves the ideal friction characteristics that provide both stable dressing and high polishing rate, resolving the contradiction between reliability and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polishing pad achieves a high polishing rate while maintaining stable dressing properties, with reduced friction coefficients and improved adhesion to the material being polished.
Implementation Method 1
a value of a static friction coefficient measured in accordance with JIS K7125 of 1.2 or less
Data Source
AI summary
The present invention provides a polishing pad that can polish a material to be polished at a high polishing rate in a polishing process, and can be stably dressed. The polishing pad contains a hydrogenated block copolymer (I) which is in an amount of 5% by mass or more, and which satisfies the following conditions (1) and (2), and which has a value of a static friction coefficient measured in accordance with JIS K7125 of 1.2 or less. <Condition (1)>: The hydrogenated block copolymer (I) is a hydrogenated product of a block copolymer containing a vinyl aromatic monomer unit, and a conjugated diene monomer unit. <Condition (2)>: The hydrogenated block copolymer (I) contains at least one polymer block (a) principally containing a vinyl aromatic monomer unit, and a content of the polymer block (a) principally containing a vinyl aromatic monomer unit in the hydrogenated block copolymer (I) is 10% by mass or more.