Image Sensor Color Filter Mask Layout for Uniform Light Reception
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Solution Overview
Problem
Image sensors face challenges in achieving uniform light reception due to deviations in color filter arrangements, leading to increased light deviation between adjacent color filters during the manufacturing process.
Innovation Solution
A manufacturing method for image sensors involves using photolithography masks with specific patterns to form color filters, where first and second patterns are arranged diagonally with rectangular main patterns and sub-patterns, preventing adjacent color filters from connecting and reducing light deviation by controlling the size and arrangement of sub-patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If color filters are arranged in a conventional symmetrical pattern, then manufacturing is simpler, but light reception uniformity deteriorates due to connectivity issues between adjacent filters
Solution Approach 1:
The patent applies asymmetry by designing mask patterns where sub-patterns at different corners have different sizes. Specifically, first sub-patterns at first corners are larger than second sub-patterns at second corners, creating an asymmetric arrangement that prevents connectivity between adjacent color filters while maintaining manufacturing feasibility
Solution Approach 2:
The patent implements local quality by making different corners of the same pattern type have different sub-pattern sizes. First corners have larger first sub-patterns while second corners have smaller second sub-patterns, allowing targeted control of light reception characteristics at different locations to achieve overall uniformity
2Volume of moving object
If miniaturization is pursued for high resolution, then device size is reduced, but light deviation increases due to asymmetrical color filter arrangements
Solution Approach 1:
The patent uses asymmetric mask patterns with differently sized sub-patterns to prevent connectivity between miniaturized color filters. This asymmetric design compensates for the increased light deviation that occurs at smaller scales by ensuring proper spacing and optical isolation between adjacent filters
Solution Approach 2:
The patent addresses light deviation in miniaturized sensors by introducing dimensional variations in the mask pattern design. The sub-patterns extend in specific directions from the main pattern, creating controlled spatial relationships that maintain uniform light reception even when overall device size is reduced
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method ensures that color filters are not connected during manufacturing, thereby reducing light deviation and improving color uniformity in image sensors.
Implementation Method 1
patterning the color filter layer using a photolithography mask to form first color filters
Data Source
AI summary
A manufacturing method of an image sensor includes, operations of: forming a color filter layer over a plurality of pixel regions having a plurality of photodetectors and arranged in a matrix on a substrate, and patterning the color filter layer with a mask including patterns disposed adjacently in a diagonal direction of the matrix, to form color filters for some of the plurality of pixel regions on the substrate. Each of the patterns may include a rectangular main pattern and sub-patterns outwardly extending from corners of the main patterns. Sizes of sub-patterns of different adjacent patterns that face each other may have sizes that are smaller than other sub-patterns of the adjacent patterns.