Image Sensor Via-Trench Pad Structure for Reliable Interconnects

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Solution Overview

Problem

Current image sensors face challenges in enhancing product reliability, particularly in the design and integration of substrates, wiring structures, and pad patterns, which affect the overall performance and efficiency of light reception and signal processing.

Innovation Solution

The proposed image sensor design includes a first and second substrate with specific wiring structures, via trenches, and pad patterns, which are integrated to improve light reception and signal processing by enhancing electrical connectivity and reducing exposure to external factors, thereby increasing product reliability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a via trench penetrates the first substrate and first wiring structure to connect to the second wiring, then electrical connectivity is improved, but the substrate and wiring structures are exposed to external factors reducing reliability

Engineering Contradiction:
Improveproduct reliabilityVSAvoidexposure to external factors
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent introduces a pad pattern as an intermediary element that fills the via trench and mediates between the first substrate/wiring structure and the second wiring structure. This pad pattern protects the exposed wiring from external factors while maintaining electrical connectivity, thus resolving the contradiction between improved connectivity and reduced exposure to harmful factors.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If the second wiring structure is exposed in the via trench, then electrical connectivity is improved, but the risk of defects increases

Engineering Contradiction:
Improveproduct reliabilityVSAvoidrisk of defects
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The pad pattern serves as a protective intermediary that covers the exposed second wiring structure within the via trench. This intermediary structure reduces the risk of defects by protecting the wiring from environmental factors and mechanical damage, while still allowing electrical signals to pass through to the second substrate.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If a through via structure extends along the via trench, then electrical connectivity between substrates is improved, but the complexity of the wiring structure increases

Engineering Contradiction:
Improveproduct reliabilityVSAvoidwiring structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent merges the through via structure with the pad pattern by having the pad pattern fill and integrate with the via trench region. This combining approach simplifies the overall structure by reducing the number of separate components and manufacturing steps, thereby reducing complexity while maintaining the electrical connectivity function.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS20230395635A1Image sensor
Publication Date: 2023.12.07 SAMSUNG ELECTRONICS CO LTD
  • US20230395635A1 patent drawing
  • US20230395635A1 patent drawing
  • US20230395635A1 patent drawing

AI summary

An image sensor includes a first substrate including a first surface and a second surface opposite to the first surface, a first wiring structure provided on the second surface of the first substrate, the first wiring structure including a first wiring and a first inter-wiring insulating film, a second substrate including a third surface facing the second surface of the first substrate, and a fourth surface opposite to the third surface, a second wiring structure provided on the third surface of the second substrate, the second wiring structure including a second wiring and a second inter-wiring insulating film, a via trench penetrating the first substrate and the first wiring structure, a through via structure extending along the via trench and connected to the second wiring, and a pad pattern provided on the through via.