Imprint Apparatus Resin Pattern Transfer Error Detection
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Solution Overview
Problem
The existing imprint techniques face issues with uneven residual layer thickness and dust presence, leading to transfer errors and increased defective shots, especially when shot characteristics differ across substrates, making it difficult to determine transfer quality effectively.
Innovation Solution
An imprint apparatus equipped with an imaging unit and a controller that compares images of the resin pattern on the substrate to a reference state, allowing for real-time determination of transfer errors and ensuring consistent quality criteria across all shots.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If transfer quality is determined by comparing changes between shots on a single substrate, then transfer quality can be assessed, but the quality of the first shot cannot be determined and criteria become different for respective substrates
Solution Approach 1:
The patent applies preliminary action by obtaining a reference image in advance before actual pattern transfer begins. This reference image serves as a baseline for comparing all subsequent shots, enabling quality determination of the first shot and ensuring consistent criteria across different substrates. The reference image is obtained by imaging a resin surface before pattern formation or by using a pre-established standard image.
Solution Approach 2:
The patent uses copying by creating a reference image that represents the ideal or standard state, then comparing all actual transfer shots against this reference copy. This allows consistent quality assessment across different substrates and shots, including the first shot, by measuring deviations from the reference rather than comparing shots to each other.
2Productivity
If pattern transfer is continuously made on shots on the substrate, then productivity increases, but transfer errors such as residual layer thickness unevenness and dust presence cause increased defective shots
Solution Approach 1:
The patent implements feedback by imaging the resin after pattern formation and comparing the obtained image with the reference image to detect transfer errors. When defects such as residual layer thickness unevenness or dust presence are detected, the system provides feedback to stop further transfers, preventing continuous production of defective shots while maintaining high productivity for good shots.
Solution Approach 2:
The patent performs preliminary quality check by obtaining a reference image in advance and using it to evaluate each transfer shot before continuing production. This preliminary comparison allows early detection of transfer errors, enabling timely intervention to maintain reliability while preserving continuous transfer capability for productive operations.
3Manufacturing precision
If mold concave-convex pattern is pressed against resin, then pattern transfer is achieved, but uneven residual layer thickness and dust presence cause transfer errors
Solution Approach 1:
The patent replaces mechanical inspection methods with optical imaging and image processing to detect transfer errors. Instead of relying solely on physical measurement or post-processing inspection, the system uses imaging to obtain visual information about residual layer thickness and dust presence, then uses automated image comparison to identify defects, improving manufacturing precision while reducing the impact of harmful factors.
Solution Approach 2:
The patent uses feedback by imaging the transfer result and comparing it with the reference image to detect residual layer thickness unevenness and dust presence. When deviations exceeding predetermined thresholds are detected, the system provides feedback to stop further transfers, preventing propagation of defects and maintaining pattern transfer accuracy despite the presence of harmful factors during the transfer process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus ensures high yield by detecting and preventing defective shots, maintaining pattern quality and reducing errors, even when the mold pattern structure changes, by using common criteria for quality assessment.
Implementation Method 1
an imaging unit configured to image the resin formed with the pattern
Data Source
AI summary
An imprint apparatus, which performs an imprint process for forming a pattern of a mold on a resin coated on a substrate, includes an imaging unit configured to image the resin on which the pattern is formed, and a controller configured to control the imprint process. When the pattern is continuously formed on the substrate, the controller compares an image of at least a partial area imaged by the imaging unit and an image of a reference state, which is obtained in advance, and when patterns each having a difference, which falls outside an allowable range, between the images are continuously formed, it determines a transfer error.