Imprint Apparatus Gas Supply Segmentation for Bubble Prevention
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Solution Overview
Problem
Conventional imprint technologies face challenges in efficiently filling the interstice between a mold and a substrate to prevent residual air bubbles, leading to unfilled portions in the contoured pattern, and require a large auxiliary plate to maintain gas concentration, which enlarges the substrate stage.
Innovation Solution
An imprint apparatus with a gas supply unit having multiple outlets and a controller that adjusts the gas supply direction to ensure efficient gas intake into the interstice between the mold and substrate, preventing enlargement of the substrate stage by maintaining gas concentration without the need for a large auxiliary plate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas is supplied to the interstice between mold and substrate to inhibit residual air bubbles, then filling efficiency is improved, but device complexity increases due to need for auxiliary plate and gas supply system
Solution Approach 1:
The gas supply system is segmented into multiple outlets arranged in a grid pattern, allowing selective activation of specific outlets based on the position of the shot region. This segmentation enables efficient gas supply only where needed, improving filling efficiency while avoiding the need for a large auxiliary plate that would increase device complexity.
Solution Approach 2:
The system dynamically selects which gas supply outlets to activate based on the real-time position of the shot region on the substrate. This dynamic adaptation allows the gas supply to be precisely targeted to the interstice between the mold and substrate, enhancing filling efficiency without requiring a permanently enlarged auxiliary plate structure.
2Productivity
If auxiliary plate is installed to align surface height for efficient gas intake, then gas supply efficiency is improved, but substrate stage area increases
Solution Approach 1:
Instead of using a large auxiliary plate to provide a uniform surface, the invention uses multiple small gas supply outlets distributed across the substrate stage. Each outlet provides localized gas supply to the interstice where needed, achieving efficient gas intake without enlarging the overall substrate stage area.
Solution Approach 2:
The solution transitions from a two-dimensional auxiliary plate surface to a three-dimensional gas distribution system with outlets at different positions and depths. This allows gas to be supplied directly into the interstice volume between mold and substrate, achieving efficient gas intake without requiring a large planar auxiliary plate.
3Quantity of substance
If multiple gas supply outlets are used to maintain high gas concentration, then gas concentration is improved, but device complexity increases
Solution Approach 1:
The gas supply system is divided into multiple outlets that can be independently controlled. By activating only the outlets positioned under or near the shot region, the system maintains high gas concentration in the interstice without requiring all outlets to be active simultaneously, thus avoiding excessive device complexity.
Solution Approach 2:
The multiple gas supply outlets serve multiple functions: they can be selectively activated based on shot region position, provide localized gas concentration enhancement, and work in conjunction with the substrate stage movement system. This multi-functionality allows the system to maintain high gas concentration without proportionally increasing device complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively inhibits unfilled portions in the contoured pattern by rapidly raising gas concentration between the mold and substrate, improving productivity and keeping the substrate stage compact.
Implementation Method 1
it is necessary to maintain gas concentration within the interstice at a rather high value. In order to raise this interstitial gas concentration in a particularly short time
Data Source
AI summary
An imprint apparatus is provided with: an application unit; a substrate holding unit including an auxiliary plate; a gas supply unit including multiple supply outlets, which supplies gas to an interstice between a mold and a substrate, in conjunction with movement of a shot region by driving of the substrate holding unit from an application position of the application unit to a pressing position where pressing is conducted, when pressing the mold against an uncured resin applied to the shot region; and a controller which selects a supply outlet to supply the gas so that the supply outlet that supplies the gas among the multiple supply outlets is opposed by either the substrate or the auxiliary plate, while the shot region to which the uncured resin was applied is moved toward the pressing position, and which controls a direction of movement of the shot region.