Imprint Lithography Alignment via Scanned Beam Intensity
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Solution Overview
Problem
In lithography, achieving precise alignment of patterns on a substrate is crucial for functional device production, but existing methods are costly and limited by radiation source wavelength or numerical aperture, necessitating a more efficient and cost-effective alignment technique.
Innovation Solution
An imprint lithography alignment apparatus and method using an alignment radiation beam to scan and detect intensity changes from alignment marks on the imprint template and substrate gratings, allowing for precise positioning through analysis of modulation and overlap, enabling accurate coarse and fine alignment without the limitations of traditional methods.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If photolithography technologies (immersion lithography, EUV lithography) are used to achieve smaller features, then feature size is reduced and feature density is increased, but manufacturing cost increases significantly
Solution Approach 1:
The patent replaces optical lithography systems (which use complex radiation sources and projection systems) with a mechanical imprinting system. The imprint template physically contacts the substrate to transfer patterns, eliminating the need for expensive EUV sources and immersion optics while achieving comparable or better resolution.
Solution Approach 2:
The patent uses an imprint template that contains a precise copy of the desired pattern. This template is directly pressed onto the substrate to transfer the pattern, avoiding the need for complex optical projection systems and enabling cost-effective production of high-density features.
2Manufacturing precision
If alignment apparatus is used to align patterns accurately, then pattern alignment accuracy is improved, but device complexity increases
Solution Approach 1:
The imprint template includes built-in alignment marks that automatically enable alignment with the substrate. The template's own structural features serve the dual purpose of pattern transfer and alignment reference, eliminating the need for separate complex alignment apparatus.
Solution Approach 2:
The patent combines the alignment marks with the imprint template structure itself. The alignment marks are integrated into the template design, merging the alignment function with the pattern transfer function, thereby reducing overall system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach provides accurate and cost-effective alignment of imprint templates and substrates, ensuring proper pattern registration and device functionality while avoiding the high costs associated with advanced lithographic technologies like EUV lithography.
Implementation Method 1
detecting an intensity of radiation reflected or transmitted from the area
Implementation Method 2
detecting an intensity of radiation reflected or transmitted from the area
Data Source
AI summary
A method of determining a position of an imprint template in an imprint lithography apparatus is disclosed. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.