Imprint Lithography Chuck Gas Deflection
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Solution Overview
Problem
Gas inclusions between the imprint template and the substrate or imprintable medium can lead to defects in the imprinted pattern, as existing methods fail to effectively eliminate or reduce these inclusions, thereby affecting pattern quality and processing throughput.
Innovation Solution
A chuck apparatus with a second surface portion that extends around the edge of the first surface portion, deflecting gas over the substrate to direct it between the imprint template and the substrate, and a gas delivery apparatus that delivers gas in the direction of a normal vector from the patterned surface of the imprint template to facilitate the elimination of gas inclusions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional imprint lithography methods are used, then the pattern transfer capability is achieved, but gas inclusions remain trapped between the template and substrate causing defects
Solution Approach 1:
Gas is delivered to the interface between the imprint template and substrate before the imprinting process begins, allowing gas inclusions to be eliminated in advance. The gas delivery apparatus introduces gas through conduits positioned adjacent to the template, and a deflector redirects the gas flow onto the template surface, ensuring gas is present to dissolve or displace any inclusions before contact occurs.
Solution Approach 2:
Gas acts as an intermediary substance introduced between the template and substrate to eliminate harmful gas inclusions. The gas delivery system uses conduits and deflectors as intermediary components to transport and position gas at the critical interface, where it facilitates the removal of inclusions that would otherwise cause pattern defects.
2Manufacturing precision
If gas delivery is implemented to eliminate inclusions, then pattern quality improves, but device complexity increases
Solution Approach 1:
The gas delivery apparatus is segmented into distinct functional components: conduits for gas transport, deflectors for flow direction control, and a gas delivery system. This segmentation allows each component to be optimized independently and facilitates easier fabrication and maintenance while achieving the complex function of gas delivery to eliminate inclusions.
Solution Approach 2:
The chuck apparatus serves multiple functions: it holds the substrate, positions the template, and now also delivers gas to eliminate inclusions. By integrating the gas delivery capability into the existing chuck structure, the system achieves multi-functionality without requiring entirely separate apparatus, thereby limiting the increase in overall device complexity.
3Productivity
If gas inclusions are not eliminated, then the process is simple and fast, but defects occur in the imprinted pattern
Solution Approach 1:
Gas is delivered and allowed to act on the interface between template and substrate before the imprinting process begins. This preliminary action eliminates gas inclusions in advance, ensuring that when imprinting occurs, the interface is free of defects that would compromise pattern reliability, thereby maintaining high throughput without sacrificing quality.
Solution Approach 2:
The presence of gas, which could potentially cause inclusions and defects, is converted into a beneficial force by deliberately introducing gas through the delivery apparatus. This gas flow dissolves or displaces harmful inclusions, transforming the potential harm of gas presence into the benefit of inclusion elimination, ensuring reliable patterns while maintaining efficient processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces or eliminates gas inclusions, improving pattern quality and reducing the time required for their dissolution, thereby enhancing the efficiency and reliability of the imprint lithography process.
Implementation Method 1
a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion
Implementation Method 2
a gas delivery apparatus that delivers gas in the direction of a normal vector from the patterned surface of the imprint template to facilitate the elimination of gas inclusions
Data Source
AI summary
A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.