Imprint Lithography Force Control via Neutral Plane Actuation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In imprint lithography, ensuring a precise application of force to an imprint template to achieve desired deformation or curvature is challenging due to uncertainties in actuator alignment, gaps, and distortions in the supporting structure, which can lead to improper magnification or shape correction and increased resistance in the imprint process.
Innovation Solution
An imprint lithography apparatus and method that includes a support structure with an actuator and a force sensor to apply and measure force on the template, ensuring the force is applied substantially on the neutral plane, allowing for precise control of deformation or curvature through piezoelectric actuators and sensors, and potentially using a bent template to enhance liquid and gas flow.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If force is applied to the imprint template to achieve desired deformation or curvature, then magnification correction and shape correction are improved, but uncertainty in actuator alignment, gaps, and supporting structure distortions cause improper correction and increased process resistance
Solution Approach 1:
A force sensor is integrated between the support structure and the imprint template to detect the actual force applied during deformation. This feedback mechanism allows real-time monitoring and adjustment of the force, ensuring accurate magnification and shape correction while compensating for uncertainties in actuator alignment and supporting structure distortions.
Solution Approach 2:
The patent replaces conventional mechanical actuation systems with piezoelectric actuators that can apply precise forces directly to the neutral plane of the template. This substitution eliminates the need for complex mechanical linkages and reduces errors from alignment and gap issues inherent in traditional mechanical systems.
2Measurement precision
If conventional actuators are used to apply force to the template, then device complexity is reduced, but force control precision and alignment accuracy deteriorate
Solution Approach 1:
The force sensor is integrated directly into the support structure, merging the sensing function with the structural component. This integration eliminates separate sensing elements and reduces overall system complexity while maintaining high measurement precision for force applied to the template.
3Manufacturing precision
If force is applied off the neutral plane of the template, then ease of operation is improved, but template deformation control and pattern quality deteriorate due to increased resistance and gas pocket formation
Solution Approach 1:
The patent applies force specifically at the neutral plane of the template, a localized region where bending stresses are minimal. This targeted approach ensures uniform template deformation without inducing unwanted stresses or resistance, while facilitating smooth liquid and gas flow during the imprinting process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate magnification and shape correction, reduces resistance during the imprint process, and minimizes the formation of gas pockets, resulting in improved pattern quality and efficiency.
Implementation Method 1
piezoelectric actuators and sensors
Implementation Method 2
piezoelectric actuators and sensors
Data Source
AI summary
An imprint lithography apparatus is disclosed that includes a support structure configured to hold an imprint template. The apparatus further includes an actuator located between the support structure and a side of the imprint template, when the imprint template is held by the support structure, configured to apply a force to the imprint template and a force sensor between the support structure and a side of the imprint template, when the imprint template is held by the support structure.