Imprint Lithography Suction-Based Template Control
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Solution Overview
Problem
Current imprint lithography techniques face challenges such as deformation of substrates and templates due to high pressures and temperature differentials, leading to pattern distortion and reduced throughput, especially when trying to achieve sub-100 nm feature sizes.
Innovation Solution
Incorporating a radiation detection system to monitor the interface between the imprint template and the imprintable material, allowing for real-time detection of radiation scattering or reflection, which indicates the completion of material flow into the template recesses, enabling precise control over the imprinting process and reducing unnecessary contact time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If high pressure is applied to push the template onto the substrate, then the imprintable material flows into the template recesses, but the substrate and template deform leading to pattern distortion
Solution Approach 1:
The patent replaces the conventional mechanical push-based imprinting system with a suction-based system. A suction force is applied to the template, creating a pressure difference that draws the imprintable material into the template recesses without requiring high contact pressure between the template and substrate. This eliminates the mechanical deformation problem while achieving complete material flow into the pattern features.
2Manufacturing precision
If considerable time is allowed for material flow into template recesses, then complete pattern transfer is achieved, but the throughput of the lithography process decreases
Solution Approach 1:
The patent employs a periodic suction action where vacuum is applied in controlled intervals during the imprinting process. This periodic suction creates dynamic pressure variations that accelerate the flow of imprintable material into the template recesses, achieving complete pattern transfer in a shorter time compared to continuous low-pressure or static pressure methods.
Solution Approach 2:
The patent dynamically changes the pressure parameter by applying suction force, which creates a pressure gradient that actively draws the material into the template features. This parameter change from static pressure to dynamic suction pressure significantly reduces the time required for complete material flow while maintaining pattern accuracy.
3Reliability
If high pressure is used to ensure complete material flow, then pattern transfer is complete, but the template and substrate suffer deformation and potential damage
Solution Approach 1:
The patent substitutes the high-contact-pressure mechanical pushing system with a suction-based system that acts on the template from above. The suction force creates a pressure differential that pulls the material into the template features without requiring strong mechanical contact between the template and substrate, thereby preserving the structural integrity of both components while ensuring complete pattern transfer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the precision and speed of the imprint lithography process by ensuring complete material flow without deformation, thereby improving the resolution and overlay accuracy of the imprinted patterns and increasing the overall productivity of the lithography apparatus.
Implementation Method 1
detecting radiation scattered from an interface between the imprint template and the imprintable material on the substrate
Implementation Method 2
detecting radiation reflected by the substrate
Data Source
AI summary
A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.