Imprint Lithography Template Overlap for Extrusion Control

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Solution Overview

Problem

In nano-fabrication processes, particularly in imprint lithography, extrusions formed during the patterning process can inhibit the formation of subsequent imprint fields by preventing the template from achieving a suitable distance from the substrate, leading to discontinuities in the residual layer and wastage of valuable substrate real-estate due to the need for separation of imprint fields.

Innovation Solution

The implementation of methods to minimize or prevent extrusions includes optimizing the volume and deposition of polymerizable material, retracting material from the edges of the imprinting area, using a stepping pattern to equalize edge abutment, and employing an overlap imprinting technique to confine polymerizable material between previously imprinted fields, thereby maintaining consistent residual layer thickness and maximizing substrate utilization.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-generated harmful factors

If imprint fields are separated to prevent extrusions, then extrusion formation is reduced, but substrate real-estate utilization decreases and productivity is reduced

Engineering Contradiction:
Improveextrusion formationVSAvoidsubstrate real-estate utilization
Core Design Contradiction:
Object-generated harmful factorsVSProductivity

Solution Approach 1:

The patent applies preliminary action by retracting polymerizable material from the edges of the imprinting area before the imprinting process begins. This preventive measure ensures that material does not flow onto previously imprinted fields during pressing, eliminating extrusions without requiring field separation and thereby maintaining high substrate utilization.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent changes the physical state and position of the polymerizable material by retracting it from edge regions before imprinting. This parameter change (from present at edges to retracted from edges) prevents extrusion formation while allowing adjacent fields to be used, thus resolving the contradiction between preventing extrusions and maximizing substrate usage.

Inventive Principle:
Principle #35Parameter changes

2Stability of the object's composition

If imprint fields are separated to prevent extrusions, then pattern continuity is improved, but manufacturing precision decreases due to discontinuities in residual layer

Engineering Contradiction:
Improvepattern continuityVSAvoidresidual layer thickness consistency
Core Design Contradiction:
Stability of the object's compositionVSManufacturing precision

Solution Approach 1:

By retracting polymerizable material from edges before imprinting, the patent prevents extrusions that would cause residual layer discontinuities. This preliminary action ensures both pattern continuity and consistent residual layer thickness across the entire substrate, including at field boundaries, thereby improving manufacturing precision.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent enables continuous imprinting across adjacent fields without interruption or separation gaps. The retraction method ensures that polymerizable material remains confined to current imprint fields while allowing the imprinting process to continue continuously across the entire substrate, maintaining both pattern continuity and residual layer consistency.

Inventive Principle:
Principle #20Continuity of useful action

3Manufacturing precision

If polymerizable material volume is increased to ensure complete filling, then imprint quality improves, but extrusion formation increases

Engineering Contradiction:
Improveimprint qualityVSAvoidextrusion formation
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent applies local quality by differentiating the treatment of polymerizable material in different regions: in the center regions of imprint fields, sufficient material is provided for complete filling and high-quality imprinting, while at edge regions, material is retracted to prevent extrusion formation. This spatial differentiation allows both goals to be achieved simultaneously.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The retraction of polymerizable material from edges is performed as a preliminary action before imprinting begins. This allows the material to be positioned optimally - sufficient volume remains in the imprint area for complete filling and high-quality patterns, while edge material is preemptively removed to prevent extrusions during the pressing process.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

These methods effectively minimize or prevent extrusions, allowing for the formation of continuous patterned layers with consistent residual layer thickness across the substrate, enhancing process efficiency and maximizing substrate real-estate utilization in nano-fabrication processes.

Implementation Method 1

a formable liquid is solidified to form a rigid layer that has a pattern conforming to a shape of the surface of the template

Methodology Applied
Scientific EffectPolymerization: Photopolymerisation

Data Source

PatentUS11199772B2Adjacent field alignment
Publication Date: 2021.12.14 CANON NANOTECHNOLOGIES INC
  • US11199772B2 patent drawing
  • US11199772B2 patent drawing
  • US11199772B2 patent drawing

AI summary

Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.