Imprint Mold Release Layer Cleaning via Light Irrigation

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing nanoimprint technologies face challenges in effectively cleaning release layers formed using fluoroalkyl- or alkyl-based silane coupling agents, as alkali-based cleaning agents are repelled by the water-repellent layers, leading to incomplete removal and reduced releasability of imprinting molds, especially those made of materials like quartz glass or silicon.

Innovation Solution

A two-step cleaning process is implemented, first reducing the water contact angle of the release layer using light irradiation or ashing, followed by an alkali cleaning agent application to break siloxane bonds and remove the release layer, allowing for efficient regeneration of the mold with improved releasability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a release layer is formed on the imprinting mold to prevent material deposition, then the mold's releasability is improved, but the release layer cannot be effectively removed by alkali-based cleaning agents due to water repellency, leading to reduced mold lifespan

Engineering Contradiction:

ImprovereleasabilityVSAvoidmold lifespan

Core Design Contradiction:

ReliabilityVSDuration of action of stationary object

Solution Approach 1:

The patent applies preliminary action by performing light irradiation or plasma treatment on the release layer before applying the cleaning agent. This preliminary step modifies the surface properties of the release layer, making it more susceptible to subsequent alkali-based cleaning agent action, thereby enabling effective removal after multiple use cycles

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent changes the physical and chemical parameters of the release layer surface through light irradiation or plasma treatment. These parameter changes include modifying surface energy, creating micro-roughness, or generating reactive groups that enhance the effectiveness of alkali-based cleaning agents in removing the release layer

Inventive Principle:

Principle #35Parameter changes

2Ease of manufacture

If an alkali-based cleaning agent is used to clean the release layer, then cleaning effectiveness is improved, but the cleaning agent is repelled by the water-repellent release layer, making cleaning difficult and time-consuming

Engineering Contradiction:

Improvecleaning effectivenessVSAvoidcleaning ease

Core Design Contradiction:

Ease of manufactureVSEase of operation

Solution Approach 1:

The patent introduces light or plasma as an intermediary that mediates between the water-repellent release layer and the alkali-based cleaning agent. This intermediary modifies the release layer surface to eliminate water repellency, allowing the cleaning agent to effectively contact and remove the release layer without being repelled

Inventive Principle:

Principle #24Intermediary (Mediator)

3Loss of time

If the release layer is not completely removed from the mold, then cleaning time is reduced, but the formation of a fresh release layer is obstructed, compromising mold performance

Engineering Contradiction:

Improvecleaning timeVSAvoidfresh release layer formation

Core Design Contradiction:

Loss of timeVSReliability

Solution Approach 1:

The patent implements feedback by using contact angle measurement to monitor the cleaning process. The contact angle serves as a feedback parameter that indicates whether the release layer has been sufficiently removed, allowing the cleaning process to be optimized to achieve complete removal without unnecessary time consumption

Inventive Principle:

Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This process ensures thorough removal of the release layer, extends the mold's usage cycles, and enables cleaning of molds with poor alkali resistance, reducing manufacturing and imprinting costs while maintaining pattern integrity.

Implementation Method 1

first reducing the water contact angle of the release layer using light irradiation or ashing

Methodology Applied

Scientific EffectLight irradiation: Photodissociation

Implementation Method 2

first reducing the water contact angle of the release layer using light irradiation or ashing

Methodology Applied

Scientific EffectAashing: Plasma

Implementation Method 3

followed by an alkali cleaning agent application to break siloxane bonds and remove the release layer

Methodology Applied

Scientific EffectChemical bond breaking: Chemical Bonding

Data Source

PatentUS9844802B2Process and apparatus for cleaning imprinting molds, and process for manufacturing imprinting molds

Publication Date: 2017.12.19 DAI NIPPON PRINTING CO LTD

AI summary

The cleaning process of cleaning an imprinting mold including a release layer coupled via siloxane bonds to a substrate of that release layer includes a first cleaning step and a second cleaning step. In the first cleaning step, the angle of contact of the surface of the release layer with water is made small, and in the second cleaning step, the alkali cleaning agent is brought in contact with the release layer that has gone through the first cleaning step.