Imprint Template Position Sensors for Lithography Alignment

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

In imprint lithography, the size and/or shape changes of the imprint template over time can lead to misalignment with the substrate, affecting the precision of pattern alignment and feature size/shape matching.

Innovation Solution

An imprint lithography apparatus with a holder for the imprint template and a plurality of position sensors that measure changes in the template's size and/or shape, ensuring accurate alignment by mechanically isolating the sensors from the template and using piezo-electric actuators to adjust the template's dimensions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the imprint template is used repeatedly for patterning, then productivity increases, but the template size and shape change over time causing alignment deterioration

Engineering Contradiction:
Improvepattern transfer efficiencyVSAvoidalignment precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent employs position sensors to continuously monitor the position of the imprint template and feeds this information back to the alignment system. This feedback mechanism enables real-time detection of template position changes and allows for dynamic adjustment to maintain alignment precision throughout repeated use

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent replaces mechanical alignment methods with optical or electromagnetic field-based measurement systems. Position sensors using optical fields detect template position changes without physical contact, eliminating mechanical interference and enabling more precise measurement and adjustment

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Measurement precision

If position sensors are mechanically connected to the imprint template for measurement, then measurement precision improves, but the sensors are affected by template vibrations and deformations

Engineering Contradiction:
Improvetemplate position measurement accuracyVSAvoidmeasurement stability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent introduces optical fields or electromagnetic fields as intermediaries between the position sensors and the imprint template. These fields transmit position information without requiring mechanical connection, allowing accurate measurement while isolating sensors from template vibrations and deformations

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent replaces mechanical coupling between sensors and template with non-contact optical or electromagnetic field-based measurement. This substitution eliminates the transmission of mechanical vibrations to sensors while maintaining measurement precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution allows for precise alignment and maintenance of the imprint template's size and shape during operation, ensuring consistent pattern alignment and feature precision, even as the template undergoes changes due to heat or other factors.

Implementation Method 1

a plurality of position sensors which are configured to measure change of the size and/or shape of the imprint template

Methodology Applied
Scientific EffectPosition detection:

Implementation Method 2

using piezo-electric actuators to adjust the template's dimensions

Methodology Applied
Scientific EffectPiezo-electric effect: Piezoelectric Effect

Data Source

PatentUS10712678B2Imprint lithography apparatus and method
Publication Date: 2020.07.14 ASML NETHERLANDS BV
  • US10712678B2 patent drawing
  • US10712678B2 patent drawing
  • US10712678B2 patent drawing

AI summary

An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.