Inclined Door Unit for High-Pressure Substrate Processing
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in withstanding high pressures during supercritical fluid processing due to friction between components, leading to grinding issues and potential contamination.
Innovation Solution
A substrate processing apparatus with an inclined chamber and door surface design, coupled with a clamp unit and sealing system, minimizes friction and ensures secure sealing to withstand high pressures, using a clamp unit with inclined surfaces and a U-shaped sealing member to maintain contact and prevent particle ingress.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a clamp unit is used to withstand high pressure inside the processing space, then pressure resistance is improved, but friction between components increases causing grinding issues
Solution Approach 1:
The patent applies curved surface designs to the clamp unit components, specifically the clamp insert groove and clamp bodies, to replace traditional flat or angular contact surfaces. This curvature design allows for more uniform pressure distribution and reduces concentrated stress points that cause friction-induced grinding, while maintaining the structural strength needed to withstand high pressures during supercritical fluid processing
Solution Approach 2:
The patent introduces localized structural features including protrusions and recesses at specific contact points of the clamp unit. These localized quality modifications create optimized contact zones that enhance pressure resistance while minimizing overall friction. The protrusion-recess interface provides precise alignment and controlled contact areas that reduce unnecessary friction between the clamp bodies and the chamber door assembly
2Reliability
If the door unit is pushed by high pressure, then sealing is maintained, but components experience friction and grinding
Solution Approach 1:
The inclined surface design of the door unit incorporates curved geometries that distribute the high pressure forces more evenly across the sealing interface. This reduces concentrated friction at specific contact points while maintaining effective sealing between the door unit and chamber, preventing both leakage and grinding damage
Solution Approach 2:
The patent introduces the clamp unit as an intermediary mechanism between the high-pressure environment and the door unit. The clamp unit absorbs and distributes the pressure forces through its specialized geometry, reducing the direct frictional load on the sealing surfaces of the door unit while maintaining the necessary sealing pressure
Data Source
AI summary
The substrate processing device according to one embodiment may comprise: a chamber unit provided with a processing space therein and comprising an inclined chamber surface having an opening; a door unit comprising an inclined door surface, which corresponds to the inclined chamber surface, and capable of being coupled to the chamber unit; and a door driving unit for driving the door unit so as to open/close the processing space.


