Infrared Imaging Electrode Layout Using Amorphous Oxide Semiconductor

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Solution Overview

Problem

Infrared sensors using ITO electrodes face reduced sensitivity due to absorption of near-infrared wavelengths, necessitating a solution to enhance sensitivity while maintaining cost-effectiveness for mass production.

Innovation Solution

An imaging device with a first electrode made of amorphous oxide semiconductor material and a photoelectric converter using compound semiconductor material, where the first electrode is formed on the light entering side to reduce absorption of near-infrared wavelengths, allowing for improved sensitivity and cost-efficient production.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If ITO is used as an electrode material in an infrared sensor, then the electrode can be formed with good electrical conductivity and transparency in the visible range, but absorption increases in the near-infrared range causing decreased sensitivity

Engineering Contradiction:
Improveelectrode transparency and conductivityVSAvoidlight absorption in near-infrared range
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent changes the physical state parameter of the ITO material from crystalline to amorphous by controlling the deposition conditions (low temperature, specific sputtering parameters). This parameter change reduces the absorption coefficient in the near-infrared range while maintaining electrical conductivity, directly resolving the contradiction between transparency and absorption.

Inventive Principle:
Principle #35Parameter changes

2Object-affected harmful factors

If a different electrode material is used to reduce near-infrared absorption, then sensitivity may improve, but manufacturing cost and process complexity increase

Engineering Contradiction:
Improvenear-infrared absorptionVSAvoidmanufacturing cost and process simplicity
Core Design Contradiction:
Object-affected harmful factorsVSEase of manufacture

Solution Approach 1:

The patent makes ITO serve multiple functions: it acts as both the electrode material and the transparent conductive layer without requiring additional specialized materials. By achieving near-infrared transparency through amorphous state control, the same ITO layer fulfills both electrical conduction and optical transparency requirements across a broader wavelength range, eliminating the need for alternative materials.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The configuration reduces light absorption in the infrared range, enhancing sensitivity and enabling the use of ITO as a general transparent electrode material, facilitating mass production while maintaining stable optical properties.

Implementation Method 1

the ITO exhibits absorption with respect to a wavelength in a near-infrared range or longer, for example

Methodology Applied
Scientific EffectAbsorption (EM radiation): Absorption (EM radiation)

Implementation Method 2

An imaging device that performs photoelectric conversion on a wavelength in a visible range

Methodology Applied
Scientific EffectPhotoelectric conversion: Photoelectric Effect

Data Source

PatentUS12074178B2Imaging device and electronic apparatus
Publication Date: 2024.08.27 SONY SEMICON SOLUTIONS CORP
  • US12074178B2 patent drawing
  • US12074178B2 patent drawing
  • US12074178B2 patent drawing

AI summary

An imaging device according to one embodiment of the present disclosure includes a first electrode, a second electrode, and a photoelectric converter. The first electrode includes an oxide semiconductor material having an amorphous state. The second electrode is opposed to the first electrode. The photoelectric converter is provided between the first electrode and the second electrode, and includes a compound semiconductor material.