Etching Method Using Inkjet Resist for Precision Corrosion Control
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Solution Overview
Problem
Conventional etching methods face issues with unintended corrosion of non-target areas and incomplete resist detachment, leading to defective yields due to unexpected resist detachment during the surface corroding step and resist residue remaining on the surface.
Innovation Solution
The method involves using resist liquid containing monofunctional and polyfunctional monomers/oligomers for precise resist formation, with ink jet printing for UV curing, ensuring high crosslink density for corrosion resistance and low crosslink density for easy detachment, improving yield and processing speed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist liquid is used for forming resist, then the resist may detach unexpectedly during the surface corroding step, but using resist liquid with monofunctional and polyfunctional monomers/oligomers increases manufacturing precision
Solution Approach 1:
The patent changes the chemical composition parameters of the resist liquid by incorporating both monofunctional monomers (providing solubility and detachment capability) and polyfunctional monomers (providing crosslinking and corrosion resistance). This dual-component approach allows the resist to maintain stability during etching while remaining detachable afterward, resolving the contradiction between manufacturing precision and reliability.
Solution Approach 2:
The patent creates a composite resist system combining monofunctional and polyfunctional monomers/oligomers. The polyfunctional components form a crosslinked network that prevents unexpected detachment during corrosion, while the monofunctional components ensure solubility for controlled detachment after etching. This composite structure simultaneously achieves both reliability and manufacturing precision.
2Strength
If resist liquid with high crosslink density is used, then corrosion resistance improves, but resist detachment becomes difficult
Solution Approach 1:
The patent carefully controls the crosslink density parameter by balancing the ratio of polyfunctional to monofunctional monomers. The polyfunctional monomers provide necessary crosslinking for corrosion resistance, while the monofunctional monomers maintain sufficient chain mobility and solubility for easy detachment. This parameter optimization resolves the contradiction between strength and ease of manufacture.
3Productivity
If UV curing type resist liquid is used, then processing speed increases, but curing completeness must be maintained
Solution Approach 1:
The patent replaces traditional mechanical or thermal curing methods with UV photopolymerization. The UV-curable resist liquid contains photoinitiators that trigger rapid polymerization upon UV exposure, achieving complete curing in seconds. This substitution dramatically increases processing speed while maintaining curing completeness through the inherent efficiency of photopolymerization chemistry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances yield by preventing unintended corrosion and facilitating easy resist removal, while the UV curing process accelerates the overall processing speed compared to organic solvent-based methods.
Implementation Method 1
the resist forming step is a step of forming the resist by the resist liquid containing monofunctional monomers or monofunctional oligomers, and polyfunctional monomers or polyfunctional oligomers
Data Source
AI summary
A solution is characteristic in being an etching method that processes a surface of a target object by corroding the surface by a corrosive, and the etching method includes: a resist forming step of forming a resist on the surface using resist liquid by ink jet printing the resist liquid on the surface; a surface corroding step of corroding a portion of the surface where the resist is not formed by bringing the corrosive into contact with a surface side of the target object where the resist has been formed in the resist forming step; and a resist detaching step of detaching the resist from the surface after the surface corroding step, wherein the resist forming step is a step of forming the resist by the resist liquid containing monofunctional monomers or monofunctional oligomers, and polyfunctional monomers or polyfunctional oligomers.