Inline Microwave Batch Degas Chamber for Substrate Processing
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Solution Overview
Problem
Existing substrate processing systems require multiple degassing chambers to increase throughput, which is costly and inefficient due to the bulky footprint of individual chambers.
Innovation Solution
A substrate processing chamber with a polygon-shaped interior volume, selectively sealable elongated openings, a movable substrate support, a heat source, and a microwave source, along with a pump port, allowing for efficient degassing of multiple substrates in a single chamber, reducing physical footprint and increasing throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple degassing chambers are provided to increase throughput, then processing capacity is improved, but device complexity and physical footprint increase
Solution Approach 1:
The patent combines multiple substrate processing functions into a single integrated chamber. The chamber body can accommodate multiple substrates simultaneously through configurable substrate supports, allowing batch processing of multiple substrates in one degassing cycle. This merging approach achieves increased throughput without requiring multiple separate chambers, thereby reducing device complexity and physical footprint while maintaining improved processing capacity
2Productivity
If multiple degassing chambers are provided to increase throughput, then processing capacity is improved, but physical footprint increases
Solution Approach 1:
The patent transitions from horizontal expansion (multiple chambers side by side) to vertical utilization. The chamber body includes configurable substrate supports that can be positioned at different heights and configurations, enabling batch processing of multiple substrates in a single vertical chamber. This dimensional change allows increased processing capacity within a compact footprint by utilizing vertical space rather than requiring additional horizontal chamber installations
3Manufacturing precision
If substrates are degassed individually in separate chambers, then processing quality is maintained, but processing time increases
Solution Approach 1:
The patent enables continuous batch processing by allowing multiple substrates to be degassed simultaneously in the same chamber. The configurable substrate supports permit continuous loading and processing of substrate batches without requiring chamber evacuation and re-evacuation cycles between individual substrates. This continuous action maintains processing quality through consistent degassing conditions while significantly reducing total processing time by eliminating sequential bottlenecks
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables efficient degassing of substrates, reducing contamination and improving processing quality by allowing for batch processing and uniform heating, while minimizing the physical footprint and operational costs.
Implementation Method 1
a microwave source coupled to the chamber body at a first end of the chamber body
Implementation Method 2
uniform heating
Implementation Method 3
a pump coupled to the chamber body at a second end of the chamber body opposite the first end
Data Source
AI summary
Methods and apparatus for a substrate processing chamber are provided herein. In some embodiments, a substrate processing chamber includes a chamber body having sidewalls defining an interior volume having a polygon shape; a selectively sealable elongated opening disposed in an upper portion of the chamber body for transferring one or more substrates into or out of the chamber body; a funnel disposed at a first end of the chamber body, wherein the funnel increases in size along a direction from an outer surface of the chamber body to the interior volume; and a pump port disposed at a second end of the chamber body opposite the funnel.