Thermally Sprayed Insulating Film With Buffering Layer
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Solution Overview
Problem
Conventional plasma processing apparatuses face insulation failure and electric discharges due to damage of thermally sprayed films at high temperatures during plasma processes, particularly in semiconductor and LCD device manufacturing.
Innovation Solution
A plasma processing apparatus structure featuring a thermally sprayed insulating film with an insulating protection member and a buffering insulating layer, made of materials with different linear expansion coefficients, to prevent contact and stress on the film, ensuring insulation integrity even at high temperatures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a thermally sprayed insulating film is used on the base member, then the insulation performance is improved, but the film is damaged at high temperatures due to thermal expansion differences
Solution Approach 1:
The insulating surface is segmented into multiple layers: a thermally sprayed insulating film layer and an insulating protection member layer with a buffering surface between them. This segmentation allows each layer to handle different functional requirements - the thermally sprayed film provides base insulation while the protection member handles thermal expansion stress.
Solution Approach 2:
A buffering surface is introduced as an intermediary between the thermally sprayed insulating film and the insulating protection member. This buffering surface prevents direct contact between the two layers, eliminating stress concentration and preventing film damage caused by differential thermal expansion.
2Productivity
If the plasma process is performed at high temperature, then the processing capability is improved, but the thermally sprayed film is damaged causing electric discharge
Solution Approach 1:
The insulating protection member with the buffering surface is pre-installed on the base member before the plasma process. This preliminary protective structure is already in place to prevent film damage before high-temperature processing begins, ensuring insulation integrity throughout the process.
Solution Approach 2:
The buffering surface acts as a cushioning layer that absorbs and distributes thermal expansion stress before it can reach the thermally sprayed insulating film. This beforehand cushioning prevents stress concentration and film damage during high-temperature plasma processing.
3Stability of the object's composition
If the insulating protection member is made of material with different linear expansion coefficient, then thermal expansion stress is reduced, but the structure complexity increases
Solution Approach 1:
Different regions of the insulating surface have different material properties - the thermally sprayed insulating film provides electrical insulation while the insulating protection member with buffering surface provides mechanical stress management. Each local region is optimized for its specific function.
Solution Approach 2:
The insulating surface uses a composite structure combining a thermally sprayed insulating film (typically ceramic material) with an insulating protection member (typically metal or ceramic with appropriate thermal expansion properties). This composite structure leverages the advantages of different materials to achieve both insulation and thermal expansion compatibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents damage to the thermally sprayed film and subsequent electric discharges by managing thermal expansion differences, maintaining insulation and ensuring reliable plasma processing at elevated temperatures.
Implementation Method 1
made of a material having a linear expansion coefficient different from that of the base member; and a buffering surface covered with an insulating layer interposed between the thermally sprayed insulating film and the insulating protection member to prevent a contact therebetween
Data Source
AI summary
A structure, for use in a processing chamber of a plasma processing apparatus in which a plasma process is performed on a target substrate, includes a base member at least having a first surface and a second surface; and a thermally sprayed insulating film covering the first surface. Further, the structure includes an insulating protection member covering the second surface and made of a material having a linear expansion coefficient different from that of the base member; and an insulating layer interposed between the thermally sprayed insulating film and the insulating protection member to prevent a contact therebetween. The thermally sprayed insulating film, the insulating protection member and the insulating layer constitute an insulating surface covering the first surface and the second surface.


