Integrated Bias-Tee Circuit for Electrooptic Transducer Biasing

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Solution Overview

Problem

Existing integrated circuits face challenges in efficiently combining low-frequency bias voltages with high-frequency signals, particularly in electrooptic and optoelectric transducers, due to impedance mismatch and parasitic effects.

Innovation Solution

The development of an integrated circuit that integrates an electrooptic or optoelectric transducer and a capacitor on the same substrate, using a single fabrication process, enables the formation of a compact Bias-Tee structure that optimizes stray capacitances and parasitic resistances/inductances.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If discrete RFIC or packaged components are used to implement Bias-Tee, then the circuit functionality is achieved, but the device complexity and manufacturing complexity increase

Engineering Contradiction:
Improvemanufacturing complexityVSAvoidcircuit integration
Core Design Contradiction:
Ease of manufactureVSDevice complexity

Solution Approach 1:

The patent merges the Bias-Tee circuit with the electrooptic or optoelectric transducer into a single integrated circuit device. The capacitor and inductor elements are fabricated using the same semiconductor fabrication processes as the transducer, integrating multiple previously discrete components into one unified structure, thereby reducing both device complexity and manufacturing complexity

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The integrated circuit serves multiple functions simultaneously: it acts as both the electrooptic or optoelectric transducer and the Bias-Tee circuit. The capacitor and inductor structures are designed to perform both their respective circuit functions while also being compatible with the transducer fabrication process, enabling a single device to replace multiple separate components

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Reliability

If capacitor and inductor are integrated at the same level, then stray capacitances are optimized, but fabrication process complexity increases

Engineering Contradiction:
Improveparasitic optimizationVSAvoidfabrication process
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent utilizes standard semiconductor fabrication parameters and materials to create capacitor and inductor structures that can be formed at the same level as the transducer. By using conventional fabrication techniques with adjusted process parameters, the design achieves optimized parasitic characteristics without requiring complex or non-standard fabrication processes

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The capacitor and inductor structures are designed with specific local geometries and material properties that optimize their electrical characteristics. The structures are positioned and dimensioned to minimize stray capacitances and parasitic effects while maintaining compatibility with the overall fabrication process

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution allows for efficient biasing of high-frequency signals and large bias voltages, reducing manufacturing complexity and cost while enhancing the compactness and adaptability of the device.

Implementation Method 1

a capacitor (12)

Methodology Applied
Scientific EffectCapacitance: Capacitance

Data Source

PatentUS20250147346A1Electrooptic or optoelectric integrated circuit enabling a bias-tee and method for fabricating the same
Publication Date: 2025.05.08 ETH ZURICH
  • US20250147346A1 patent drawing
  • US20250147346A1 patent drawing
  • US20250147346A1 patent drawing

AI summary

The invention relates to an integrated circuit (1), comprising: a substrate (10) which supports an electrooptic or optoelectric transducer (11) and a capacitor (12), wherein at least one electrically conductive element of the transducer (11) and at least one electrically conductive element of the capacitor (12) are arranged at the same level with respect to the substrate (10). The invention further relates to a method for fabricating the same.