Interlayer Insulating Film Segmentation for Moisture Resistance
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Solution Overview
Problem
In display devices, the use of a film with a fast etch rate for the third interlayer insulating film leads to moisture ingress and display unevenness due to its non-dense film quality, particularly at the substrate ends.
Innovation Solution
A manufacturing method involving the formation of a two-layer second interlayer film with a lower layer film and an upper layer film, where the upper layer film is removed partially, especially near the substrate ends, to prevent moisture ingress and ensure a dense film quality, thereby reducing display unevenness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If a film with a fast etch rate is used for the third interlayer insulating film, then the etching process is improved, but moisture ingress and display unevenness occur due to non-dense film quality
Solution Approach 1:
The third interlayer insulating film is divided into two separate films: a first interlayer insulating film with dense film quality and a second interlayer insulating film with fast etch rate. This segmentation allows each film to fulfill its specific function independently, resolving the contradiction between etching speed and moisture resistance
Solution Approach 2:
Different regions of the interlayer insulating structure are assigned different material properties. The first interlayer insulating film uses a material with dense quality for moisture resistance, while the second interlayer insulating film uses a material with fast etch rate for efficient patterning. Each layer has optimized local quality suited to its specific function
2Speed
If a film with a fast etch rate is used for the third interlayer insulating film, then the etching process is improved, but display unevenness occurs
Solution Approach 1:
The interlayer insulating film is segmented into two layers with distinct functions. The first layer provides a dense, uniform base that ensures display uniformity, while the second layer enables fast etching for contact hole formation. This segmentation allows the etching process to be fast without compromising display uniformity
Solution Approach 2:
The first interlayer insulating film is specifically designed with dense film quality to ensure uniform display characteristics, while the second interlayer insulating film is designed with fast etch rate for efficient processing. Each layer's local quality is optimized for its specific function, resolving the contradiction between etching speed and display uniformity
3Reliability
If the second interlayer film is removed completely, then moisture resistance is improved, but the structural integrity and coverage are compromised
Solution Approach 1:
The problematic second film is selectively removed only from specific regions where it causes harm (substrate end portions prone to moisture ingress), while being retained in other regions where it provides beneficial structural coverage and support. This selective extraction maintains strength while improving moisture resistance
Solution Approach 2:
The second interlayer insulating film is selectively removed from specific local regions (substrate end portions) where moisture resistance is critical, while being retained in other regions where structural integrity is more important. This local differentiation of film presence optimizes both moisture resistance and structural strength
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively prevents moisture from entering the active region of the display device, reducing display unevenness and improving the overall performance by ensuring a dense film quality and proper coverage of the transparent conductive film.
Implementation Method 1
a second interlayer insulating film is formed on the first interlayer insulating film and in the first contact hole, the second interlayer insulating film having a first film and a second film provided above the first film, the second film having an etching rate faster than an etching rate of the first film
Data Source
AI summary
Since a film, which is the upper layer of an interlayer insulating film and has a fast etching rate, does not have dense film quality, moisture is entered from the end portion of a substrate, and it is likely that display unevenness and the like occur. A manufacturing method of a display device includes the steps of: forming a first contact hole on the first interlayer film; forming a second interlayer film on the first interlayer film and in the first contact hole, the second interlayer film having a lower layer film and an upper layer film having an etching rate faster than an etching rate of the lower layer film; forming a second contact hole on the second interlayer film; and removing at least a part of the upper layer film.