Interlayer Insulating Layer Design for Impact Resistance
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Solution Overview
Problem
Display apparatuses are prone to damage and dark spots when subjected to external impacts, particularly in flexible or bent configurations, due to internal layer breakage, which affects image clarity.
Innovation Solution
A display apparatus design featuring a substrate with a first and second semiconductor layer, an interlayer insulating layer comprising multiple inorganic layers including oxide and nitride layers with varying densities and hydrogen content, and metal layers with specific stress properties, all formed using a rotary type sputtering device to enhance impact resistance and prevent layer damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the interlayer insulating layer thickness is increased to prevent internal layer breakage and dark spots, then impact resistance is improved, but device complexity and manufacturing difficulty increase
Solution Approach 1:
The interlayer insulating layer is divided into multiple inorganic insulating layers with different materials and properties. Each layer serves a specific function: the first nitride layer provides compressive stress to counteract tensile stress from the semiconductor layer, the oxide layer provides insulation and stress balance, and the second nitride layer with lower density reduces overall warpage. This segmentation allows the structure to achieve high impact resistance without excessive total thickness.
Solution Approach 2:
The patent controls specific parameters of each layer to optimize performance: the first nitride layer has higher density and compressive stress, the second nitride layer has lower density to reduce warpage, and the oxide layer thickness is controlled to balance stress. By adjusting these parameters, the multi-layer structure achieves improved impact resistance while maintaining manageable device complexity.
2Strength
If multiple inorganic insulating layers with different densities are used to reduce warpage and prevent breakage, then layer strength is improved, but manufacturing precision requirements increase
Solution Approach 1:
The interlayer insulating layer uses a composite structure of different inorganic materials (nitride and oxide layers with different densities). The first nitride layer has higher density for strength and compressive stress, while the second nitride layer has lower density to reduce warpage. This composite approach distributes the functional requirements across different materials, making the manufacturing process more controllable despite the multiple layers.
Solution Approach 2:
Different regions of the interlayer insulating layer have different material compositions and densities tailored to local requirements. The first nitride layer with higher density is positioned where compressive stress is needed, while the second nitride layer with lower density is positioned to reduce overall warpage. This local optimization of material properties strengthens the structure while maintaining manufacturing feasibility.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures a clear image even after external impact by increasing the interlayer insulating layer's thickness and reducing warpage, thereby preventing internal layer damage and maintaining display quality.
Implementation Method 1
formed using a rotary type sputtering device
Data Source
AI summary
A display apparatus includes a substrate, a first semiconductor layer disposed on the substrate, a second semiconductor layer disposed on the first semiconductor layer, an interlayer insulating layer disposed on the second semiconductor layer and including a plurality of inorganic insulating layers, a source electrode or a drain electrode disposed on the interlayer insulating layer and respectively connected to the first semiconductor layer or the second semiconductor layer, and an organic light emitting element connected to the source electrode or the drain electrode, where the plurality of inorganic insulating layers include an oxide layer, a first nitride layer disposed on the oxide layer and having a first density, and a second nitride layer disposed on the first nitride layer and having a second density lower than the first density.