Intermetallic Barrier Layer for Printed Circuit Substrate ECM

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Solution Overview

Problem

Printed circuit substrates face reliability issues due to electrochemical migration (ECM) when exposed to high-temperature and high-humidity environments, leading to electrical short circuits, especially as component sizes decrease and integration increases.

Innovation Solution

A printed circuit substrate with a barrier layer made of inter-metallic compounds such as Cu—Sn, Cu—Zn, Cu—Sb, Cu—In, Ni—B, Ni—Sn, or Ag—Sn is applied to cover the circuit pattern, preventing metal ion movement and conductive filament growth, thereby suppressing electrochemical migration and potential short circuits. The barrier layer is formed through processes like annealing of auxiliary layers or sequential deposition between the insulating layer and circuit pattern.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the line width of circuit patterns and intervals between patterns are reduced to achieve higher integration, then device density is improved, but reliability deteriorates due to increased susceptibility to electrochemical migration

Engineering Contradiction:
Improvedevice integration densityVSAvoidresistance to electrochemical migration
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

A barrier layer made of inter-metallic compound is introduced as an intermediary between the circuit pattern and the external environment. This barrier layer specifically suppresses electrochemical migration from the circuit pattern, preventing the harmful interaction between moisture/pollutants and the metal electrodes while allowing the circuit pattern to maintain its fine pitch for high integration.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of manufacture

If conventional printed circuit substrates are used without barrier layers, then manufacturing simplicity is maintained, but electrical short circuits occur due to electrochemical migration in high-temperature and high-humidity environments

Engineering Contradiction:
Improvemanufacturing process simplicityVSAvoidresistance to electrochemical migration
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The barrier layer serves as a protective intermediary that can be integrated into the existing manufacturing process. It is formed on the circuit pattern through standard thin-film deposition techniques, adding minimal complexity to the manufacturing process while providing critical protection against electrochemical migration in harsh environments.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If a barrier layer is added to suppress electrochemical migration, then reliability is improved, but device complexity increases

Engineering Contradiction:
Improveprevention of electrical short circuitVSAvoidstructural complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The barrier layer is applied selectively only where needed - specifically on the circuit pattern surfaces that are susceptible to electrochemical migration. This localized approach provides targeted protection against short circuits while minimizing the overall structural complexity and material usage compared to a complete coating of the entire substrate.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The barrier layer effectively prevents short circuits and enhances the reliability and density of printed circuit substrates, allowing them to function reliably in extreme environments without compromising fine pitch or mass production feasibility.

Implementation Method 1

electrochemical migration (hereinafter, referred to as 'ECM') phenomenon is generated, such that it may degrade reliability of the printed circuit substrate. Herein, the electrochemical migration is a phenomenon that when voltage is applied between two metal electrodes that are electrically insulated, together with the absorption of moisture including pollutants, it becomes electrochemically unstable, such that conductive filaments grow between the two metal electrodes to cause an electrical short circuit.

Methodology Applied
Scientific EffectElectrochemical migration: Electrolysis

Implementation Method 2

forming an auxiliary barrier layer that is made of metal different from that of the circuit pattern and is formed on at least one surface of the circuit pattern; and annealing between the auxiliary barrier layer and the circuit pattern.

Methodology Applied
Scientific EffectAnnealing: Annealing

Data Source

PatentUS8410373B2Printed circuit substrate and method of manufacturing the same
Publication Date: 2013.04.02 SAMSUNG ELECTRO MECHANICS CO LTD
  • US8410373B2 patent drawing
  • US8410373B2 patent drawing
  • US8410373B2 patent drawing

AI summary

Disclosed herein are a printed circuit substrate and a method of manufacturing the same. The printed circuit substrate includes an insulating layer, and a circuit layer that includes a circuit pattern disposed on the insulating layer and a barrier layer that is disposed to cover at least one surface of the circuit pattern and suppresses electrochemical migration from the circuit pattern, thereby making it possible to achieve high-density and secure reliability, and the method of manufacturing the same.