Ion Beam Cross Section Apparatus with Mask for Precision Etching
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for working and observing cross sections of electronic parts using focused ion beams are inefficient for large sections, requiring extensive time and lacking precision, and separate devices are needed for observation.
Innovation Solution
An apparatus and method that utilize a sample plate, a first ion beam lens barrel, a mask, mask-moving means, and detection means to adjust and etch the sample with a focused ion beam over a whole irradiation range, allowing precise formation and observation of cross sections without the need for separate observation devices.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a focused ion beam is used to work large cross sections, then working precision is improved, but working time increases to several tens of hours
Solution Approach 1:
The patent divides the working process into two distinct stages: a first working stage using a first ion beam for rough etching of large cross sections, and a second working stage using a second focused ion beam for precise finishing. This segmentation allows each stage to be optimized for its specific function, resolving the contradiction between precision and speed by handling different requirements at different times.
Solution Approach 2:
The patent dynamically switches between two different ion beam systems based on the working stage. The first ion beam system operates with higher current for rapid material removal, while the second focused ion beam system operates with lower current for precise work. This dynamic adaptation of beam parameters to working requirements resolves the contradiction between speed and precision.
2Manufacturing precision
If a focused ion beam is used to work large cross sections, then working precision is improved, but the amount of electric current for irradiation is limited
Solution Approach 1:
The patent segments the ion beam current usage into two stages: the first ion beam stage uses higher current for rapid etching where precision requirements are less stringent, while the second focused ion beam stage uses lower current for precision work. This segmentation allows efficient energy utilization across the entire working process.
Solution Approach 2:
The patent changes the beam current parameter between working stages. The first ion beam operates at higher current density for bulk material removal, while the second focused ion beam operates at lower current density for precise finishing. This parameter change optimizes both energy efficiency and working precision at different stages.
3Productivity
If mechanical method is used to work cross sections, then working time is reduced, but positional precision on the cross section is lost
Solution Approach 1:
The patent uses mechanical methods only for sample mounting and positioning, while reserving ion beam methods for the actual cross section working. This segmentation allows mechanical speed advantages in positioning while maintaining ion beam precision in the working process itself.
Solution Approach 2:
The patent introduces a mask as an intermediary element that bridges mechanical positioning and ion beam working. The mask is mechanically positioned to define the working area, then the ion beam works through the mask opening with high precision, combining the advantages of both mechanical and ion beam methods.
4Adaptability or versatility
If separate devices are used for working and observing, then functional specialization is achieved, but device complexity increases
Solution Approach 1:
The patent merges the working and observation functions into a single integrated apparatus. The ion beam working system and the electron beam observation system share the same vacuum chamber and sample stage, allowing seamless transition between working and observation without moving the sample between different devices.
Solution Approach 2:
The patent creates a multi-functional apparatus that can perform both ion beam working and electron beam observation on the same sample in the same chamber. This universal system eliminates the need for separate devices while maintaining the functional advantages of both working and observation capabilities.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient working and precise observation of large cross sections with maintained positional accuracy, reducing working time and eliminating the need for separate observation equipment.
Implementation Method 1
a first ion beam lens barrel capable of irradiating the sample placed on the sample plate with a first ion beam over a whole predetermined irradiation range at one time
Implementation Method 2
a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance generated by the irradiation of the sample or the mask with the beam of charged particles
Data Source
AI summary
The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.