Ion Beam Electrode Assembly With Selective Chemical Cleaning
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Solution Overview
Problem
Conventional ion beam processing apparatuses face challenges in selectively removing adhering matter from electrodes due to the use of the same material for both electrodes, leading to strong adhesion and mechanical deformation during cleaning, reducing the electrode's lifespan.
Innovation Solution
Differentially materialize the first and second electrodes with distinct materials, such as Mo and Ti or Ti and pyrolytic graphite, allowing for selective etching using chemical agents that dissolve the second electrode material faster than the first, thereby reducing mechanical stress and deformation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the same material (Mo) is used for both the first electrode and the second electrode, then the electrode assembly has uniform material properties and manufacturing simplicity, but the adhering matter from the second electrode strongly adheres to the first electrode making it difficult to remove during cleaning
Solution Approach 1:
The patent applies different materials to different electrodes (first electrode vs. second electrode) based on their specific functional requirements and exposure to adhering matter. The first electrode uses a material resistant to adhesion with the second electrode's material, while the second electrode uses a material suitable for its etching function, creating local material optimization rather than uniform material selection throughout the electrode assembly.
Solution Approach 2:
The patent introduces material asymmetry between the first electrode and second electrode, breaking the symmetry of using identical Mo material for both. This asymmetric material selection (different materials for electrodes in different positions with different exposure to adhering matter) enables selective removal of adhering matter while maintaining manufacturing feasibility.
2Ease of operation
If mechanical force (blasting) is applied to remove adhering matter from the first electrode, then the adhering matter can be removed, but the electrode undergoes deformation and its lifespan is reduced
Solution Approach 1:
The patent replaces the mechanical cleaning method (blasting with mechanical force) with a chemical cleaning method. By selecting materials for the first and second electrodes that have different chemical reactivity, the adhering matter can be selectively removed through chemical reactions without applying mechanical stress to the electrode structure, thereby preserving electrode integrity and extending lifespan.
Solution Approach 2:
The patent changes the chemical parameters (material composition) of the electrodes to enable selective chemical removal of adhering matter. By choosing materials with different chemical properties (reactivity, dissolution rates), the cleaning process can target the adhering matter specifically without affecting the electrode structure, replacing mechanical removal with chemical selective dissolution.
3Ease of manufacture
If the first electrode and second electrode are made of the same material, then manufacturing is simplified, but it is not possible to selectively remove adhering matter by utilizing reactivity differences
Solution Approach 1:
The patent implements local material differentiation where the first electrode and second electrode use different materials selected according to their specific positions, functions, and exposure conditions. This local quality variation enables selective chemical cleaning capability while maintaining manufacturing simplicity through standardized material selection criteria for each electrode type.
Solution Approach 2:
The patent employs composite material selection across the electrode assembly, using different materials for the first electrode and second electrode. This composite approach (combining different materials in different locations) provides both manufacturing feasibility and selective cleaning capability, as the material differences enable chemical selectivity while the overall structure remains manufacturable.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Facilitates easy and selective removal of adhering material without mechanical force, extending the electrode assembly's life and reducing maintenance frequency.
Implementation Method 1
ions flowing out of the plasma in the ion generation chamber to the electrode assembly are accelerated by a voltage difference between the first electrode and the second electrode
Implementation Method 2
selective etching using chemical agents that dissolve the second electrode material faster than the first
Data Source
AI summary
Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.