Ion Beam Shaping via Reference Aperture Calibration
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Solution Overview
Problem
Existing methods for precision milling with charged particle beams face challenges in achieving high beam current for rapid processing while maintaining a sharp cutting edge, as higher currents result in less precise cuts and lower currents lead to longer processing times.
Innovation Solution
A method that involves directing an ion beam through a reference aperture to form a reference beam, which is then optimized using selected optical component parameters, and subsequently through a working aperture to form a working beam with a higher current and a sharp edge, maintaining the sharp edge profile for efficient milling.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If higher beam current is used, then processing speed increases, but manufacturing precision deteriorates
Solution Approach 1:
The patent divides the beam delivery system into two separate aperture paths: a reference aperture for calibration and a working aperture for high-current processing. This segmentation allows the system to maintain precise beam shaping at lower currents while enabling high-current operation, thus resolving the contradiction between processing speed and cutting precision.
Solution Approach 2:
The system performs preliminary calibration using a reference aperture at lower beam currents to establish precise beam geometry and focus. This preliminary action creates a calibrated reference state that enables subsequent high-current working operations to maintain precision despite the higher current, thereby resolving the contradiction between speed and precision.
2Manufacturing precision
If lower beam current is used, then manufacturing precision improves, but productivity decreases
Solution Approach 1:
The patent segments the operational modes into calibration mode (low current, high precision) and processing mode (high current, high productivity). By providing separate apertures for each mode, the system can switch between them, allowing high-current operations to achieve both precision and productivity simultaneously.
Solution Approach 2:
The system changes the beam current parameter dynamically: using lower current during reference aperture calibration to achieve precise beam geometry, then switching to higher current during working aperture processing to maximize material removal rate while maintaining the calibrated precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for faster processing with a high beam current while maintaining the precision and sharpness of the cutting edge, improving milling efficiency compared to prior methods.
Implementation Method 1
A charged particle beam, laser beam, and neutral particle beam are used in a variety of microfabrication applications
Implementation Method 2
a source generates charged particles which are then focused by an optical column into a beam
Data Source
Figure 1A~2B
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AI summary
A method for charged particle beam processing includes emitting ions from an ion source; forming the ions into an ion beam; directing the ion beam through an optical column having optical components positioned along an optical axis; directing the ion beam through a reference aperture (304) to form a reference beam having a reference beam current and a reference beam shape; adjusting the optical components to provide a desired reference beam profile at the work piece surface; and processing the work piece by directing the ion beam through a working aperture (312) instead of through the reference aperture to form a working beam, the working beam having a working beam current that is greater than the reference beam current and a working beam shape on the work piece surface that is different from the reference beam shape; wherein the reference beam profile includes an edge profile along a first direction and the working beam has the same edge profile along the same direction, thereby providing a higher current working beam to process a work piece more rapidly than the reference beam, while providing an edge sharpness that is similar to that of the reference beam in at least one direction. An apparatus is described for carrying out the method.