Ion Beam Scanner and Collimator for Ribbon and Spot Mode
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Solution Overview
Problem
Conventional ion implanters require separate configurations for ribbon beam and spot beam modes, leading to inefficiencies and the need for multiple dedicated machines, as the geometry for collimating spot beams is unsuitable for ribbon beams and vice versa, limiting flexibility and dose control uniformity.
Innovation Solution
An ion implanter apparatus with a scanner that outputs a diverging ion beam and a collimator with beam adjustment components to adjust ion trajectories, allowing operation in both ribbon beam and spot beam modes without additional optical components, by using a controller to send signals for beam adjustment and trajectory correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a single ion implanter is configured for ribbon beam mode, then high current implantation is achieved, but spot beam mode cannot be operated
Solution Approach 1:
The beamline is configured with a universal collimator and adjustable beam transport components that can handle both ribbon beam and spot beam modes. The collimator is positioned and oriented to receive both beam types, and the beam adjustment components can be reconfigured to accommodate the different geometries, allowing a single system to perform multiple functions without requiring separate dedicated machines
Solution Approach 2:
The beamline incorporates adjustable and reconfigurable components including beam adjustment components with movable elements that can change the beam trajectory and geometry. These dynamic adjustments allow the system to switch between ribbon beam and spot beam configurations by modifying the beam transport path and collimator positioning, enabling adaptability without permanent fixed configurations
2Adaptability or versatility
If beam adjustment components are added to enable spot beam mode, then beam flexibility is improved, but the geometry for collimating spot beams differs from ribbon beam
Solution Approach 1:
The beam adjustment components are specifically designed to modify local beam properties at different locations in the beamline. The components can selectively adjust the beam trajectory and geometry in specific regions to accommodate the different collimation requirements of spot beams versus ribbon beams, allowing precise control of beam quality for each mode while maintaining overall system functionality
Solution Approach 2:
The system utilizes adjustable parameters of the beam adjustment components including position, angle, and orientation that can be changed to accommodate different beam geometries. By modifying these parameters, the beamline can transition between ribbon beam and spot beam configurations, with the collimator geometry and beam transport parameters being adjusted to maintain precise collimation for each beam type
3Manufacturing precision
If a scanner is used for spot beam scanning, then dose uniformity control is improved, but the scanner is superfluous in ribbon beam mode
Solution Approach 1:
The scanner is integrated into the beamline as a universal component that serves different functions depending on the operating mode. In spot beam mode, the scanner performs beam scanning for dose uniformity control. In ribbon beam mode, the scanner can be positioned or configured to allow direct beam transport without scanning, or it can be used for other beam adjustment functions, eliminating redundancy while maintaining versatility
4Reliability
If separate dedicated machines are used for ribbon beam and spot beam implantation, then each machine is optimized for its specific mode, but processing efficiency decreases
Solution Approach 1:
The invention merges the functionality of separate ribbon beam and spot beam implanters into a single integrated system. The beamline components, including the ion source, mass resolving slit, collimator, and beam adjustment components, are configured to handle both beam types within one machine. This consolidation allows the system to maintain mode-specific optimization while improving processing efficiency by eliminating the need to transfer substrates between separate dedicated machines
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables flexible operation in both ribbon beam and spot beam modes within a single ion implanter, improving dose control uniformity and eliminating the need for separate machines, thereby enhancing processing efficiency and convenience.
Implementation Method 1
the spot beam first enters a scanner that generates an oscillating deflection of the spot beam in order to generate a diverging ion beam envelope
Implementation Method 2
the collimator, which form a collimated ion beam that is directed to the substrate being processed
Data Source
AI summary
An apparatus to control an ion beam includes a scanner configured in an first state to scan the ion beam wherein the scanner outputs the ion beam as a diverging ion beam; a collimator configured to receive along a side of the collimator the diverging ion beam and to output the diverging ion beam as a collimated ion beam; a beam adjustment component that extends proximate the side of the collimator; and a controller configured to send a first signal when the scanner is in the first state to the beam adjustment component to adjust ion trajectories of the diverging ion beam from a first set of trajectories to a second set of trajectories.


