Ion Implantation Control System for Rapid Beam Optimization
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Solution Overview
Problem
Current ion implantation devices require significant time to compress the spatial distribution of ion beams, typically taking around five to ten minutes, which hinders the efficiency of semiconductor processing. The stored optimum operating conditions often cannot be reproduced due to ion source deterioration, leading to longer adjustment times.
Innovation Solution
An ion implantation device control method that measures the spatial distribution of the ion beam, estimates the emittance using an ion beam trajectory calculation method, and calculates the operating conditions for the optical elements to achieve a desired spatial distribution, allowing for rapid optimization of ion beam parameters without the need for additional emittance measurement devices.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If manual adjustment of optical element operating conditions is performed to compress spatial distribution, then spatial distribution compression is achieved, but processing time becomes excessively long (5-10 minutes)
Solution Approach 1:
The patent replaces manual mechanical adjustment of optical elements with an automated control system that calculates optimal operating conditions based on measured spatial distribution data. The control system uses measurement results to automatically determine the optimal operating conditions for optical elements, eliminating the need for time-consuming manual adjustment while achieving the same spatial distribution compression effect.
Solution Approach 2:
The system performs self-adjustment by automatically processing measurement data and calculating optimal operating conditions without external intervention. The control system uses the measured spatial distribution to autonomously determine the best operating parameters for optical elements, enabling the system to optimize itself rapidly without requiring operator involvement.
2Ease of operation
If stored optimum operating conditions are used as initial values, then adjustment process is simplified, but actual optimum conditions cannot be obtained due to ion source deterioration
Solution Approach 1:
The patent implements a feedback mechanism where the actual spatial distribution is measured and used to calculate the true optimal operating conditions. Instead of relying on stored historical data, the system continuously measures the current spatial distribution and adjusts operating conditions based on real-time feedback, ensuring accuracy despite ion source deterioration over time.
Solution Approach 2:
The system dynamically determines operating conditions based on measured spatial distribution parameters rather than using fixed stored values. By calculating optimal conditions from actual measurement data, the system adapts to changes in ion source characteristics and other varying parameters, ensuring reliable reproduction of optimum conditions regardless of component aging.
3Measurement precision
If beam profile monitor is used for measurement, then spatial distribution can be measured, but emittance cannot be directly obtained requiring additional measurement devices
Solution Approach 1:
The patent introduces a trajectory calculation method as an intermediary computational process that bridges the gap between spatial distribution measurement and emittance determination. Instead of requiring direct emittance measurement hardware, the system uses the measured spatial distribution data and applies trajectory calculations to derive emittance values, eliminating the need for additional expensive measurement devices.
Solution Approach 2:
The patent replaces physical emittance measurement devices with a computational approach. By using trajectory calculation methods on measured spatial distribution data, the system substitutes complex hardware-based emittance measurement with software-based calculation, significantly reducing device complexity while maintaining measurement accuracy.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the rapid determination of optimum operating conditions, reducing the startup and recipe change time to approximately one minute, improving throughput by minimizing ion implantation time and avoiding costly additional hardware requirements.
Implementation Method 1
an ion beam emitted from an ion source is accelerated or decelerated to a predetermined energy by an accelerating tube
Implementation Method 2
converged by quadrupole lenses to irradiate the substrate
Implementation Method 3
the ion beam is scanned while the irradiation is performed
Implementation Method 4
the more the ion beam diverges due to the space charge effect
Data Source
AI summary
A control method of an ion implantation device that radiates an ion beam emitted from an ion source via an optical element onto a material to be treated, includes the steps of: measuring the spatial distribution of the ion beam in the vicinity of the material to be treated; estimating the emittance, which is the spatial and angular distribution of the ion beam of the ion source, from the measured spatial distribution, by using an ion beam trajectory calculation method; calculating the operating conditions of the optical element so that the ion beam in the vicinity of the material to be treated has a desired spatial distribution, by using the estimated emittance and the trajectory calculation method; and operating the ion implantation device by using the calculated operating conditions of the optical element.