Ion Implanter Beam Regulating Portion for Current Density Uniformity
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Solution Overview
Problem
Existing ion implanters fail to accurately regulate the current density distribution of ribbon ion beams, leading to uneven ion implantation on substrates, and existing optimization methods using neural networks and genetic algorithms are time-consuming and complex with poor robustness.
Innovation Solution
An ion implanter with a beam regulating portion that uses unit lens elements to set and adjust magnetic or electric fields, determining regulation intensities based on measured current density distributions and applying these intensities to adjacent elements with a fixed ratio, ensuring precise control of the current density distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a ribbon ion beam with wider lateral width is used to process the entire lateral width region of the substrate at once, then processing efficiency is improved, but current density distribution becomes non-uniform resulting in uneven ion implantation
Solution Approach 1:
The beam regulating portion is divided into multiple independent unit lens elements arranged along the beam width direction. Each unit lens element can independently adjust the current density at its corresponding position, enabling localized control of the ribbon ion beam's current density distribution while maintaining the overall wide beam width for efficient processing
Solution Approach 2:
Each unit lens element provides localized magnetic field adjustment to correct current density non-uniformity at specific positions across the beam width. This allows different regions of the ribbon ion beam to have optimized current density characteristics, achieving uniform ion implantation across the entire substrate width while maintaining high processing efficiency
2Manufacturing precision
If optimization methods using neural networks and genetic algorithms are used to set magnetic field intensity, then current density distribution can be regulated, but processing time increases and robustness deteriorates
Solution Approach 1:
The regulation system is segmented into independent unit lens elements, each with its own measurement and adjustment capability. This modular structure enables parallel processing of current density measurements and adjustments across different beam positions, significantly reducing the time required compared to sequential optimization methods
Solution Approach 2:
The system implements real-time feedback by measuring the actual current density distribution and using this information to adjust the magnetic field intensity of each unit lens element. This closed-loop control achieves accurate current density regulation without requiring time-consuming iterative optimization algorithms, improving both speed and robustness
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach efficiently and accurately regulates the current density distribution, reducing processing time and improving robustness compared to prior methods, allowing for precise ion implantation on substrates.
Implementation Method 1
a beam regulating portion that, in order to regulate a current density distribution of the ribbon ion beam... arranges unit lens elements along the direction of the beam width of the ribbon ion beam, and regulates and sets an intensity of a magnetic field or electric field to be created by each unit lens element
Implementation Method 2
regulates and sets an intensity of a magnetic field or electric field to be created by each unit lens element
Implementation Method 3
an ion source that generates an ion beam and shapes the generated ion beam into the ribbon ion beam
Data Source
AI summary
The ion implanter includes lens elements that arrange unit lens elements along a direction of a beam width of a ribbon ion beam and regulate a magnetic field or electric field to be created by each unit lens element in order to regulate a current density distribution of the ion beam, and a controlling portion that sets the intensity of the magnetic field or electric field to be created by the unit lens element to be regulated by the lens elements in accordance with the measured current density distribution. The regulation intensity of the magnetic field or electric field to be created by the unit lens element that corresponds to a position to be regulated in the unit lens elements of the lens elements is determined from the measured current density distribution and a value obtained by multiplying the determined regulation intensity by a fixed ratio is determined as the regulation intensity of the magnetic field or electric field for the magnetic field or electric field to be created by a unit lens element adjacent to the unit lens element.