Ion Implanter Beam Deflector Trajectory Correction
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Ion implanters face precision issues due to installation errors in beamline components, leading to trajectory errors and inaccuracies in ion beam implantation angles and positions on the workpiece, which are exacerbated by the length of the beamline and combination of errors from multiple components.
Innovation Solution
An ion implanter design incorporating a beam deflector, a beam scanner, and a collimator with a focus at the scan origin, where the beam deflector corrects the ion beam's x-direction deflection angle to ensure the actual trajectory intersects with the reference trajectory at the scan origin on the xz plane, using a controller to adjust the beam deflector's angle and a collimating lens to collimate the ion beam in the z-direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If beamline components are installed at designed positions as precisely as possible, then manufacturing precision is improved, but installation errors still cause trajectory errors that are enlarged during ion beam transportation
Solution Approach 1:
The patent applies preliminary action by measuring and calculating trajectory errors before ion beam implantation, then pre-adjusting the beam deflector to compensate for these errors. The controller calculates the required deflection angle correction based on measured installation errors, and the beam deflector is adjusted beforehand to intersect the actual trajectory with the reference trajectory at the scan origin, preventing trajectory errors from being enlarged during transportation.
2Adaptability or versatility
If the beamline is made longer to transport ion beam from ion source to workpiece, then the ion implanter can accommodate more beamline components, but trajectory errors are further enlarged during transportation
Solution Approach 1:
The patent applies parameter changes by dynamically adjusting the beam deflector's deflection angle based on measured trajectory errors. The controller calculates the correction angle needed to compensate for installation errors in beamline components, and the beam deflector is controlled to provide this correction, ensuring that the actual ion beam trajectory intersects with the reference trajectory at the scan origin, thereby maintaining implantation precision despite long beamline transportation.
3Ease of operation
If multiple beamline components are combined to transport and adjust ion beam, then beam control capability is improved, but trajectory errors are enlarged by combination of errors from each component
Solution Approach 1:
The patent applies feedback by measuring the actual positions of beamline components, calculating the cumulative trajectory errors from all components, and using this information to adjust the beam deflector. The controller receives data on installation errors from multiple components, calculates the total deflection angle correction needed, and controls the beam deflector to compensate for the combined errors, ensuring accurate ion beam implantation despite the presence of multiple error sources.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces implantation angle errors to ±0.1° or less, ensuring high precision in ion implantation by compensating for installation errors and maintaining accurate ion beam alignment throughout the beamline.
Implementation Method 1
a beam deflector capable of deflecting an ion beam in an x direction
Implementation Method 2
a beam collimator disposed downstream of the beam scanner and comprising a collimating lens that collimates the scanned ion beam in a z direction, the collimating lens having a focus at a scan origin of the beam scanner
Data Source
AI summary
A beamline unit of an ion implanter includes a steering electromagnet, a beam scanner, and a beam collimator. The beamline unit contains a reference trajectory of an ion beam. The steering electromagnet deflects the ion beam in an x direction perpendicular to a z direction. The beam scanner deflects the ion beam in the x direction in a reciprocating manner to scan the ion beam. The beam collimator includes a collimating lens that collimates the scanned ion beam in the z direction along the reference trajectory, and the collimating lens has a focus at a scan origin of the beam scanner. A controller corrects a deflection angle in the x direction in the steering electromagnet so that an actual trajectory of the deflected ion beam intersects with the reference trajectory at the scan origin on an xz plane.