Ion Source Assembly with Intermediate Potential Spacer
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Solution Overview
Problem
Static mass spectrometers face challenges in achieving high sensitivity due to large interior volumes and potential arcing issues caused by high voltage components, which reduce the ability to analyze minute gas quantities effectively.
Innovation Solution
An ion source assembly with a spacer held at an intermediate potential between the ion source and the mounting element, reducing the free volume and increasing pressure for ionization, while minimizing the risk of arcing through controlled voltage application.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If the ion source is held at high potential with respect to the mounting element, then ionization efficiency is improved, but the risk of arcing increases
Solution Approach 1:
The patent divides the voltage potential into multiple levels by introducing an intermediate potential between the high potential ion source and the ground potential mounting element. This segmentation of the electric field reduces the voltage gradient across any single gap, thereby reducing arcing risk while maintaining the high potential difference needed for ionization.
Solution Approach 2:
The patent introduces an intermediate potential as a mediator between the ion source and mounting element. This intermediate potential acts as a buffer that reduces the electric field strength in the gaps, preventing arcing while allowing the full potential difference to be utilized for ionization purposes.
2Volume of stationary object
If the distance between the ion source and mounting element is reduced, then the free volume is reduced improving sensitivity, but the risk of arcing increases
Solution Approach 1:
The space between the ion source and mounting element is segmented into multiple regions with different potentials. This allows the physical distance to be reduced for compactness while the effective electrical distance (voltage gradient) is maintained through the intermediate potential, preventing arcing.
Solution Approach 2:
Different regions of the assembly are assigned different electrical potentials to create locally optimized conditions. The intermediate potential region specifically addresses the arcing risk in the reduced space between the high potential ion source and ground potential mounting element.
3Quantity of substance
If the free volume in the ion source region is reduced, then sensitivity is improved by increasing molecule density, but the space for high voltage components is reduced
Solution Approach 1:
The patent resolves the space conflict by introducing an electrical dimension (intermediate potential) rather than requiring additional physical space. This allows the system to maintain both compact free volume for sensitivity and adequate spacing for high voltage components through electrical field management rather than physical expansion.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances sensitivity by increasing the number of molecules available for ionization and reduces arcing risks, allowing for the analysis of extremely minute gas quantities with improved signal-to-noise ratios.
Implementation Method 1
the gas to be analyzed is typically ionized by means of electron bombardment
Implementation Method 2
a spacer mounted between the mounting element and the ion source, the spacer being held at a second potential V2 with respect to the mounting element, which is less than the ion source potential V1
Data Source
AI summary
An ion source assembly for a static mass spectrometer, comprises: a mounting element for locating the assembly within the static mass spectrometer; an ion source for generating ions to be analyzed in the static mass spectrometer, the ion source being spaced from the mounting element and arranged to be held in use at a first relatively high potential V1 with respect to the mounting element; and a spacer mounted between the mounting element and the ion source, the spacer arranged to be held in use at a second potential V2 with respect to the mounting element, which is less than the first potential V1.