Laser Keyhole Depth Sensing via Mirror-Corrected Beam Alignment

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Solution Overview

Problem

Laser processing apparatuses with galvano mirrors and fθ lenses face challenges in accurately measuring keyhole depth due to chromatic aberration, which causes deviations in the irradiation positions of processing and measurement laser light, leading to inaccurate keyhole depth measurement.

Innovation Solution

A laser processing apparatus that includes a controller to adjust the first and second mirrors based on corrected processing data, which accounts for chromatic aberration, ensuring accurate alignment and measurement of keyhole depth by generating optical interference signals and using a measurement processor to project data for precise depth measurement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If a lens is used to collect processing laser light and measurement light at the same processing point, then both lights can be focused at the target position, but chromatic aberration occurs because the wavelengths of processing laser light and measurement light are different, causing deviation between irradiation positions

Engineering Contradiction:
Improvealignment of processing and measurement lightVSAvoidkeyhole depth measurement accuracy
Core Design Contradiction:
Ease of operationVSMeasurement precision

Solution Approach 1:

The system pre-calculates chromatic aberration deviation amounts for different wavelengths and processing points, and applies correction values in advance to the mirror operation amounts. This preliminary correction ensures that even though chromatic aberration occurs, the measurement light is redirected to compensate for the deviation, achieving accurate keyhole depth measurement despite the wavelength difference between processing and measurement light.

Inventive Principle:
Principle #10Preliminary action

2Device complexity

If the same lens is used for both processing laser light and measurement light, then device complexity is reduced, but chromatic aberration causes deviation in arrival positions on the processing surface

Engineering Contradiction:
Improveoptical system configurationVSAvoidirradiation position accuracy
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The system changes the operational parameters of the mirrors based on wavelength-specific correction values. By adjusting the mirror operation amounts according to pre-calculated chromatic aberration characteristics for different wavelengths, the system compensates for the positional deviation caused by using a single lens for both processing and measurement light, maintaining precision without increasing device complexity.

Inventive Principle:
Principle #35Parameter changes

3Device complexity

If chromatic aberration is not corrected, then the system operates simply without correction mechanisms, but the deviation between processing and measurement light arrival positions prevents accurate keyhole depth measurement

Engineering Contradiction:
Improvecorrection system structureVSAvoidkeyhole depth measurement accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The system incorporates a feedback mechanism where pre-calculated chromatic aberration correction data is applied to adjust mirror operations. The correction values are determined based on the specific wavelengths and processing conditions, and this feedback loop ensures that the measurement light compensates for chromatic aberration effects, achieving accurate measurement without requiring complex hardware correction mechanisms.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables accurate measurement of keyhole depth by correcting for chromatic aberration, ensuring precise alignment and measurement of keyhole depth, thereby improving the accuracy of laser processing.

Implementation Method 1

generates an optical interference signal based on interference caused by an optical path difference between the measurement light reflected at the processing point and reference light

Methodology Applied
Scientific EffectOptical interference: Interference

Implementation Method 2

since wavelengths of the processing laser light and the measurement light are different from each other, chromatic aberration occurs in the fθ lens

Methodology Applied
Scientific EffectChromatic aberration:

Implementation Method 3

a lens that collects the processing laser light and the measurement light at the processing point

Methodology Applied
Scientific EffectLight collection: Lens

Implementation Method 4

a first mirror that changes traveling directions of the processing laser light and the measurement light

Methodology Applied
Scientific EffectLight reflection: Reflection

Data Source

PatentUS20240416453A1Laser processing apparatus and laser processing method
Publication Date: 2024.12.19 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD
  • US20240416453A1 patent drawing
  • US20240416453A1 patent drawing
  • US20240416453A1 patent drawing

AI summary

A laser processing apparatus sets a processing section passing through a target position on a processing surface, sets a measurement section centered on the target position in the processing section, sets a plurality of data acquisition positions that are trajectories perpendicular to a processing direction in the measurement section. The laser processing apparatus acquires pieces of measurement data indicating shapes of keyholes at the respective data acquisition positions during processing of the processing section, and projects the pieces of measurement data in the processing direction to be superimposed on each other to create projection data. The laser processing apparatus obtains the second instruction value in a direction perpendicular to the processing direction at the target position on the basis of the projection data. Therefore, it is possible to provide a laser processing apparatus and a laser processing method capable of accurately measuring a depth of a keyhole.