Lamination Transfer Films with Engineered Voids for Nanostructure Patterning

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Solution Overview

Problem

Patterning or forming nanostructures and microstructures on large glass substrates is difficult and expensive, limiting their application in display, lighting, and photovoltaic devices.

Innovation Solution

A lamination transfer film with a sacrificial template layer and a thermally stable backfill layer is used to create engineered voids by migrating a thermally stable molecular species, forming a bridging layer that defines the nanostructured surface, allowing for efficient and cost-effective nanostructure formation on large substrates.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional photolithographic processes are used to pattern nanostructures on large glass substrates, then manufacturing precision can be achieved, but device complexity and manufacturing cost increase significantly

Engineering Contradiction:
Improvenanostructure patterning precisionVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent segments the nanostructure formation process into two independent stages: (1) forming a sacrificial template layer with desired nanostructure geometry, and (2) depositing a thermally stable backfill layer that conforms to the template surface. This segmentation eliminates the need for complex photolithographic patterning while maintaining manufacturing precision through the template's pre-formed geometry.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The sacrificial template layer is prepared in advance with the precise nanostructure geometry required, serving as a pre-formed pattern template. This preliminary action transfers the patterning complexity to template fabrication, allowing subsequent simple conformal deposition and thermal processing to achieve the final nanostructure on large substrates.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If conventional photolithographic processes are used to form nanostructures, then manufacturing precision is maintained, but ease of manufacture deteriorates due to high costs

Engineering Contradiction:
Improvenanostructure patterning precisionVSAvoidmanufacturing cost
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent uses the sacrificial template layer as a physical copy or replica of the desired final nanostructure geometry. By conformally depositing the thermally stable backfill layer onto this template and then removing the template, the final structure is a negative copy of the template, achieving precise patterning through simple replication rather than complex direct patterning.

Inventive Principle:
Principle #26Copying

Solution Approach 2:

The sacrificial template layer is designed as a temporary, disposable component that is removed after serving its patterning function. This approach eliminates the need for expensive photolithographic equipment and processes, as the template can be fabricated using simpler, lower-cost methods and then discarded after transferring its geometry to the final structure.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

3Manufacturing precision

If nanostructures are formed on large glass substrates using conventional methods, then manufacturing precision can be achieved, but productivity decreases due to process complexity

Engineering Contradiction:
Improvenanostructure patterning precisionVSAvoidproduction efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

By segmenting the process into template fabrication and conformal backfill deposition, the patent enables parallel processing and simplifies each individual step. The conformal deposition can be performed using simple atomic layer deposition or chemical vapor deposition techniques that cover large areas uniformly, significantly improving productivity compared to sequential photolithographic steps.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The copying mechanism allows single-step or few-step conformal deposition to replicate the template geometry across entire large substrate areas simultaneously, rather than requiring multiple photolithographic exposure, development, and etching steps. This dramatically reduces processing time and increases production efficiency while maintaining precision.

Inventive Principle:
Principle #26Copying

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables the formation of nanostructures on large glass substrates with improved durability and refractive index management, enhancing light management and anti-reflective properties in display and photovoltaic devices without the need for complex and costly photolithographic processes.

Implementation Method 1

A portion of the sacrificial template layer that is proximate the first surface has a greater concentration of a thermally stable molecular species than a portion of the sacrificial template layer that is proximate the second surface

Methodology Applied
Scientific EffectDiffusion: Diffusion

Implementation Method 2

baking out the sacrificial template layer to form engineered voids defined by a bridging layer and the structured surface of the thermally stable backfill layer

Methodology Applied
Scientific EffectThermal decomposition: Pyrolysis

Data Source

PatentUS9731473B2Articles with lamination transfer films having engineered voids
Publication Date: 2017.08.15 3M INNOVATIVE PROPERTIES CO
  • US9731473B2 patent drawing
  • US9731473B2 patent drawing
  • US9731473B2 patent drawing

AI summary

Transfer films, articles made therewith, and methods of making and using transfer films to form bridged nanostructures are disclosed.