Laser Ablation Patterning Transparent Conductive Layer

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Solution Overview

Problem

Conventional TFT array substrate fabrication requires multiple photo mask processes, making it costly and complicated, especially due to the need for large area exposure and precise alignment, which limits the selective patterning capabilities of laser ablation processes.

Innovation Solution

A laser ablation process that selectively patterns a transparent conductive layer without the use of a photo mask, allowing for the reduction of fabrication costs by exposing and removing specific layers on the substrate to form the TFT, pixel region, and storage capacitor.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photo mask processes are used for patterning, then manufacturing precision is improved, but device complexity and fabrication cost increase

Engineering Contradiction:
Improvepatterning precisionVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and removes the photo mask from the patterning process, replacing it with direct laser ablation. This eliminates the need for photo mask preparation, alignment, and removal steps, thereby reducing device complexity while maintaining patterning precision through direct laser writing on the ITO layer.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces the mechanical/optical photo mask system with a laser-based direct writing system. The laser beam directly ablates the ITO layer to create patterns without requiring physical photo masks, substituting a complex mechanical alignment system with a more flexible laser positioning system.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If photo mask processes are used for patterning, then manufacturing precision is improved, but fabrication cost increases

Engineering Contradiction:
Improvepatterning precisionVSAvoidfabrication cost
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The patent removes the photo mask component from the manufacturing process, eliminating costs associated with photo mask fabrication, storage, and disposal. The direct laser ablation method uses only the laser system and computer control, significantly reducing material costs while maintaining patterning precision.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent replaces expensive, reusable photo masks with a digital laser writing system that creates patterns through software control. Each pattern is written directly by the laser without requiring physical mask materials, effectively using 'cheap' digital instructions instead of 'expensive' physical masks.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

3Ease of manufacture

If laser ablation is used without photo mask, then fabrication cost is reduced, but selective patterning capability is limited

Engineering Contradiction:
Improvefabrication costVSAvoidselective patterning capability
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent replaces the photo mask selection mechanism with laser parameter control. By adjusting laser power, pulse duration, scanning speed, and wavelength, the system achieves selective patterning of different layers (ITO, organic materials, metals) without photo masks, maintaining manufacturing precision through digital control rather than physical masking.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent utilizes changes in laser parameters (power, pulse width, wavelength, scanning speed) to achieve selective ablation of different materials. This allows precise control over which layers are removed and which remain, providing selective patterning capability equivalent to or better than photo mask methods while reducing fabrication costs.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method reduces fabrication costs and simplifies the integration of machine processes by eliminating the need for photo masks, enabling more efficient and cost-effective production of TFT array substrates for LCDs.

Implementation Method 1

applying a laser ablation process to remove the patterned photoresist layer and the transparent conductive layer on the patterned photoresist layer

Methodology Applied
Scientific EffectLaser ablation: Laser Ablation

Data Source

PatentUS7547590B2Method for forming an array substrate including forming a transparent conductive layer on a photoresist and laser ablating
Publication Date: 2009.06.16 AU OPTRONICS CORP
  • US7547590B2 patent drawing
  • US7547590B2 patent drawing
  • US7547590B2 patent drawing

AI summary

Disclosed is a method for manufacturing an array substrate utilizing a laser ablation process. With the laser ablation process, a photoresist layer is removed along with the transparent conductive layer therefrom, while maintaining other portions of the transparent conductive layer. Moreover, the laser ablation process of the invention does not need additional photo-mask, so the fabrication cost can be reduced.