Laser Edge Deletion for Clean Electrochromic Window Sealing
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Solution Overview
Problem
The existing methods for fabricating electrochromic devices face challenges in achieving a clean and efficient removal of material residues during the fabrication process, which can lead to premature failure of the devices due to water ingress and corrosion, especially when integrating the devices into insulated glass units (IGUs).
Innovation Solution
The proposed method involves a narrow pre-deposition laser edge deletion (NPDLD) process, where a narrow strip of the lower conductor layer is removed after depositing the device layers, effectively acting as an in situ mask to remove the residues and improve the sealing process, ensuring a cleaner substrate surface for the IGU seal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional laser patterning is used to remove portions of the EC device stack, then material removal is achieved, but residues remain on the substrate surface leading to water ingress and corrosion
Solution Approach 1:
The patent applies preliminary action by performing a first laser deletion to remove a wide portion of the lower conductor layer at a distance from the outer edge before depositing device layers. This creates a clean peripheral region that prevents water ingress and corrosion at the seal interface, addressing the cleanliness issue before the main device assembly is complete.
2Reliability
If a wide strip of lower conductor layer is removed early in the process, then sealing surface is improved, but device functionality is compromised
Solution Approach 1:
The patent applies local quality by making the lower conductor layer width variable across the substrate surface. The layer is removed at a first width at a distance from the outer edge to create a clean seal surface, while maintaining the layer at a second width (greater than the first) in the central region to preserve device functionality. This spatial variation in conductor layer presence allows simultaneous optimization of seal integrity and device operation.
3Manufacturing precision
If multiple separate processes are used for material removal and residue cleaning, then thorough cleaning is achieved, but manufacturing complexity increases
Solution Approach 1:
The patent merges multiple functions into a single integrated process. The first laser deletion operation simultaneously performs material removal of the lower conductor layer and creates the clean peripheral surface needed for sealing. By combining these functions in one step rather than using separate processes, the patent achieves thorough cleaning while reducing fabrication process complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in a cleaner removal of residues, enhancing the reliability and performance of the electrochromic devices by preventing water ingress and corrosion, thus improving the integrity of the seal in IGU constructs.
Implementation Method 1
narrow pre-deposition laser edge deletion (NPDLD) process, where a narrow strip of the lower conductor layer is removed after depositing the device layers
Data Source
Figure 1A
Figure 1B
Figure 1C
AI summary
Certain aspects pertain to methods of fabricating an optical device on a substantially transparent substrate that include a pre-deposition operation that removes a width of lower conductor layer at a distance from the outer edge of the substrate to form a pad at the outer edge. The pad and any deposited layers of the optical device may be removed in a post edge deletion operation.