Laser Etching Apparatus Revolving Window Particle Management

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Solution Overview

Problem

Laser etching apparatuses used in organic light-emitting display manufacturing require substantial maintenance and management, leading to decreased productivity due to contamination from organic particles, which affects the efficiency and speed of the etching process.

Innovation Solution

A laser etching apparatus with a revolving window module that rotates to position an unpolluted area between the laser emitter and particle grabber, allowing for continuous operation without the need for frequent chamber cleaning, utilizing a particle grabber with a slit shield and static electricity generator to collect and manage organic particles.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a laser etching apparatus is used for organic light-emitting display manufacturing, then the etching process can be performed, but substantial maintenance and management is required due to contamination from organic particles

Engineering Contradiction:
Improveetching process efficiencyVSAvoidmaintenance time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The patent extracts the harmful organic particles from the chamber environment by introducing a particle grabber that actively collects and removes particles. This separates the particle collection function from the main etching process, allowing continuous operation without frequent maintenance interruptions.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The particle grabber operates autonomously within the chamber, continuously collecting organic particles without requiring external intervention or chamber opening. This self-service mechanism maintains the etching environment automatically, reducing maintenance time and keeping productivity high.

Inventive Principle:
Principle #25Self-service

2Reliability

If the chamber is cleaned frequently to remove organic particle contamination, then laser emitting efficiency is maintained, but productivity decreases

Engineering Contradiction:
Improvelaser emitting efficiencyVSAvoidmanufacturing speed
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The particle grabber operates continuously during the etching process, maintaining constant removal of organic particles. This continuous action ensures laser emitting efficiency is preserved without interruption, eliminating the need to stop production for cleaning and thus maintaining high manufacturing speed.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The particle grabber acts as an intermediary between the laser etching process and the chamber environment. It mediates the contamination issue by intercepting organic particles before they can significantly degrade laser efficiency, allowing both high reliability and continuous production.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Object-affected harmful factors

If a particle grabber is introduced to collect organic particles, then contamination is reduced, but device complexity increases

Engineering Contradiction:
Improveorganic particle contaminationVSAvoidapparatus structure
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The particle grabber is integrated within the existing chamber structure, merging the particle collection function with the etching environment. This consolidation adds minimal structural complexity while effectively reducing organic particle contamination through the combined operation of the grabber and laser system.

Inventive Principle:
Principle #5Merging (Combining)

4Manufacturing precision

If maintenance frequency is increased to manage contamination, then laser etching quality is maintained, but productivity decreases

Engineering Contradiction:
Improveetching qualityVSAvoidproduction output
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The particle grabber provides continuous self-service particle collection during etching operations, maintaining etching quality without requiring periodic maintenance stops. This eliminates the trade-off between quality and productivity by automatically preserving etching precision throughout continuous production.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The continuous operation of the particle grabber ensures uninterrupted particle removal, maintaining consistent etching quality throughout the production process. This continuous quality assurance enables sustained high productivity without the need for maintenance-related production pauses.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution increases productivity by reducing contamination and maintenance needs, ensuring consistent laser emitting efficiency and improving the overall efficiency of the organic light-emitting display manufacturing process.

Implementation Method 1

The laser emitter may be configured to emit a laser to the substrate disposed within the chamber through the laser port

Methodology Applied
Scientific EffectLaser: Laser

Implementation Method 2

The particle grabber may further include a static electricity generator. The static electricity generator may be disposed within the body

Methodology Applied
Scientific EffectStatic electricity generation: Electrostatics

Implementation Method 3

The revolving window may also rotate by a predetermined angle for each laser etching process performed for a predetermined number of substrates

Methodology Applied
Scientific EffectMechanical rotation:

Data Source

PatentUS11370065B2Laser etching apparatus and a method of laser etching using the same
Publication Date: 2022.06.28 SAMSUNG DISPLAY CO LTD
  • US11370065B2 patent drawing
  • US11370065B2 patent drawing
  • US11370065B2 patent drawing

AI summary

A laser etching apparatus includes a chamber, a laser port, a laser emitter, a particle grabber, and a revolving window module. The chamber is configured to receive a substrate. The laser port is disposed below the chamber in a downward direction. The laser emitter is configured to emit a laser to the substrate disposed within the chamber through the laser port. The particle grabber is disposed within the chamber and includes a body disposed over the laser port. An opening is formed through the body. The opening is configured to pass the laser therethrough. The revolving window module includes a revolving window and a driving part configured to drive the revolving window. The revolving window is disposed between the particle grabber and the laser port.