Laser Optical Module Alignment for Precise Mask Pattern Heating
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Solution Overview
Problem
The existing substrate treating methods face challenges in precisely heating specific regions of substrates during the photolithography process, leading to inaccuracies in pattern formation due to uneven laser irradiation and lack of precise etching control.
Innovation Solution
A substrate treating apparatus and method that includes an optical module with a laser unit and imaging unit, which adjusts its state at an inspection port to ensure precise irradiation and heating of specific substrate regions by aligning the laser irradiation position and adjusting the profile to meet set conditions before moving to the process position.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If laser irradiation is performed without adjusting optical module state at inspection port, then processing speed is improved, but manufacturing precision deteriorates due to uneven heating and inaccurate pattern formation
Solution Approach 1:
The optical module adjusts its state (laser irradiation position and profile) at the inspection port before moving to the process position. This preliminary adjustment ensures that the laser is properly aligned and configured to meet set conditions, thereby achieving both efficient processing and high manufacturing precision without compromising either productivity or pattern formation accuracy.
2Device complexity
If laser irradiation position is not adjusted at inspection port, then device complexity is reduced, but manufacturing precision deteriorates due to inability to correct critical dimension deviations
Solution Approach 1:
The patent replaces complex mechanical adjustment mechanisms with an automated optical adjustment system. The optical module automatically adjusts its state at the inspection port using detection and feedback mechanisms, eliminating the need for manual mechanical alignment while achieving precise critical dimension correction and maintaining manufacturing precision.
3Ease of operation
If optical module does not adjust state at standby position, then ease of operation is improved, but manufacturing precision deteriorates due to uneven laser irradiation and heating
Solution Approach 1:
The optical module performs self-adjustment at the inspection port before processing. It automatically detects and corrects its own irradiation position and profile deviations, ensuring uniform laser heating without requiring external intervention. This self-service capability maintains ease of operation while achieving high manufacturing precision and uniform heating across the substrate.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise etching and uniform heating of substrate regions, improving the accuracy of pattern formation and correcting critical dimension deviations between monitoring and anchor patterns.
Implementation Method 1
irradiating a laser to a region of the substrate on which a specific pattern is formed
Implementation Method 2
a laser must be precisely irradiated to a specific region at which the anchor pattern is formed... the anchor pattern formed on the mask may be uniformly heated
Data Source
AI summary
The inventive concept provides a mask treating method. The mask treating method includes treating a mask by supplying a liquid to the mask, and irradiating a laser to a region of the mask on which a specific pattern is formed while the liquid remains on the mask; moving an optical module including a laser unit configured to irradiate the laser between a process position for treating the substrate and a standby position deviating from the process position; and adjusting a state of the optical module at an inspection port provided at the standby position to a set condition before the optical module is moved to the process position.