Layered Electrode Structure for Active Matrix Fingerprint Sensors
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Solution Overview
Problem
Current display apparatuses with integrated fingerprint sensors face complexity in manufacturing processes and efficiency in sensing fingerprint information, particularly in integrating active matrix technology with capacitive methods.
Innovation Solution
A display apparatus with an active matrix type fingerprint sensor design, featuring a thin film transistor, semiconductor pattern, and layered electrodes, including a control electrode, sensing electrode, and insulating layers, optimized for simplified manufacturing and enhanced fingerprint sensing capabilities.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If an active matrix type fingerprint sensor is integrated into the display apparatus, then fingerprint sensing capability is improved, but manufacturing process complexity increases
Solution Approach 1:
The patent combines the fingerprint sensor electrodes (sensing electrode and control electrode) with the display apparatus structure, integrating multiple functions into a unified device. The sensing electrode and control electrode are formed within the same layered structure as the display panel, allowing simultaneous fabrication and reducing overall system complexity despite the added functionality.
Solution Approach 2:
The display apparatus structure serves multiple functions: it acts as both the display panel and the substrate for the fingerprint sensor. The insulating layers and electrode structures are designed to fulfill both display and sensing functions, eliminating the need for separate fingerprint sensor modules and simplifying the manufacturing process.
2Measurement precision
If multiple insulating layers and electrode layers are used for capacitive sensing, then sensing precision is improved, but manufacturing complexity increases
Solution Approach 1:
The fingerprint sensor is divided into distinct functional layers: the sensing electrode layer, the first insulating layer, the control electrode layer, and the second insulating layer. Each layer has a specific function in the capacitive sensing process, allowing for optimized performance while maintaining a systematic manufacturing approach where each layer is formed in a dedicated process step.
Solution Approach 2:
The patent utilizes a multi-layer vertical structure to achieve capacitive sensing functionality. By stacking electrodes and insulating layers in different vertical dimensions, the design creates multiple capacitance interfaces (sensing electrode to fingerprint, control electrode to sensing electrode) without requiring complex lateral arrangements, thus improving sensing precision while keeping the manufacturing process manageable.
3Ease of manufacture
If the control electrode is disposed under the semiconductor pattern, then manufacturing process is simplified, but electrical conductivity may be reduced
Solution Approach 1:
The control electrode is constructed as a composite structure with a first layer and a second layer. The first layer (closer to the semiconductor pattern) may be made of a material optimized for electrical conductivity and interface characteristics, while the second layer (farther from the semiconductor) provides additional conductivity and structural stability. This composite approach ensures high electrical conductivity even when the electrode is positioned under the semiconductor pattern.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution simplifies manufacturing processes and improves fingerprint sensing by using a layered electrode structure that enhances capacitive sensing, allowing for efficient recognition of fingerprint information with reduced complexity and cost.
Implementation Method 1
a first insulating layer disposed between the control electrode and the semiconductor pattern, a second insulating layer covering the input electrode and the output electrode
Implementation Method 2
a first insulating layer disposed between the control electrode and the semiconductor pattern, a second insulating layer covering the input electrode and the output electrode
Data Source
AI summary
A method of manufacturing a display apparatus includes: forming first patterns of a semiconductor material on a base layer; forming a first insulating layer covering the first patterns; forming second patterns of a conductive material on the first insulating layer; removing at least a portion of at least one of the second patterns; and forming a second insulating layer on the second patterns. Each of the second patterns includes a first layer and a second layer disposed on the first layer, the first patterns include a semiconductor pattern, the second patterns include a control electrode pattern overlapping with the semiconductor pattern in a plan view and a sensing electrode pattern, the second layer of the control electrode pattern fully covers the first layer of the control electrode pattern, and the second layer of the sensing electrode pattern is partially removed in the removing of the at least a portion to partially cover the first layer of the sensing electrode pattern.