LCD Dual Link Structure for Bezel Width Reduction
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Solution Overview
Problem
The manufacturing process of LCD devices faces challenges in reducing the number of masks used, which affects productivity and cost, particularly due to the increasing density of gate and data link lines in a shrinking inactive area and the risk of misalignment during exposure.
Innovation Solution
A dual link structure is implemented where gate and data link lines are alternately disposed on two layers, allowing for a narrower line width and reduced mask usage by forming link lines with a multi-layer structure that includes an active layer, ohmic contact layer, and transparent electrode layer, ensuring the line width remains as designed even with potential misalignment during exposure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If link lines are disposed at dense intervals in a shrinking inactive area, then the number of link lines per unit area increases, but the line width becomes narrower and misalignment risk during exposure increases
Solution Approach 1:
The patent transitions from a single-layer link line structure to a dual-layer structure, where first link lines are formed on a first layer and second link lines are formed on a second layer. This dimensional change allows link lines to be disposed at dense intervals without reducing the effective line width, as each layer can maintain adequate spacing while collectively achieving high density. The multi-layer approach resolves the contradiction by adding a vertical dimension to the layout.
Solution Approach 2:
The link line structure is segmented into multiple independent layers, with first link lines on the first layer and second link lines on the second layer. This segmentation allows each layer to be manufactured with standard line widths and spacing, avoiding the misalignment and width control issues that would arise from attempting to pack all link lines into a single layer at high density.
2Productivity
If the number of masks used in the manufacturing process is reduced, then productivity and cost improve, but the ability to precisely control link line formation decreases
Solution Approach 1:
The patent combines the formation of link lines with the formation of other device structures by using the same mask patterns for multiple purposes. The first link lines are formed simultaneously with other first-layer structures using a first mask, and the second link lines are formed simultaneously with other second-layer structures using a second mask. This merging of operations reduces the total number of masks required while maintaining precise link line formation through the inherent alignment requirements of the multi-layer device structure.
3Manufacturing precision
If exposure equipment alignment is not perfectly controlled, then manufacturing complexity increases, but the designed line width may not be maintained
Solution Approach 1:
By distributing link lines across multiple layers rather than concentrating them in a single layer, the patent creates inherent spatial separation that reduces the impact of exposure alignment errors. Each layer can be exposed and developed with standard alignment tolerances, and the vertical stacking ensures that link lines maintain their designed widths even if lateral alignment varies between layers.
Data Source
AI summary
Disclosed is an LCD device having a dual link structure and a method of manufacturing the same, which can reduce a width of a bezel. A link line structure includes a plurality of first and second link lines which are alternately disposed. The first and second link lines are formed on different layers. Also, embodiments herein provide a method which can reduce the number of masks used in a manufacturing process and can easily manufacture the LCD device in consideration of the possibility of misalignment of exposure equipment.