Liquid Crystal Display Manufacturing Process Simplification
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Solution Overview
Problem
The manufacturing of liquid crystal displays is complex and costly due to the need for multiple photolithography steps, and existing methods do not effectively prevent haze formation in pixel electrodes.
Innovation Solution
A method is developed to reduce the number of photo processes by forming a gate line, semiconductor, and data metal layer, followed by plasma treatment with a hydrogen and nitrogen gas mixture, which simplifies the manufacturing process and prevents haze in pixel electrodes by using pixel electrodes as masks for forming source and drain electrodes, and eliminating the need for contact holes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple photolithography steps are used to form gate lines, semiconductor layers, and data lines, then manufacturing precision is improved, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent combines multiple photolithography steps into a single step by forming the gate line, semiconductor layer, and data line pattern simultaneously using one photoresist layer and one photolithography process. This merging approach maintains manufacturing precision while reducing process complexity and cost.
Solution Approach 2:
The photoresist layer serves multiple functions: it defines the gate line pattern, the semiconductor layer pattern, and the data line pattern all in one step. This multi-functional use of the photoresist layer eliminates the need for separate patterning steps for each component.
2Manufacturing precision
If conventional photolithography methods are used, then manufacturing precision is maintained, but manufacturing cost and time increase
Solution Approach 1:
Multiple manufacturing operations that would traditionally require separate photolithography steps are merged into a single step. The gate line, semiconductor layer, and data line are all patterned simultaneously, improving productivity while maintaining precision through proper etching control.
Solution Approach 2:
The patent forms a unified pattern structure in advance that contains all necessary elements (gate line, semiconductor, data line) before subsequent processing steps. This preliminary unified formation simplifies later manufacturing steps and improves overall efficiency.
3Ease of manufacture
If pixel electrodes are formed before source and drain electrodes, then manufacturing simplicity is improved, but haze formation in pixel electrodes occurs
Solution Approach 1:
The patent forms the pixel electrode pattern first as a mask layer before forming the source and drain electrodes. This preliminary pixel electrode formation allows it to serve as a protective mask during subsequent etching processes, preventing haze formation while maintaining manufacturing simplicity.
Solution Approach 2:
The pixel electrode layer acts as an intermediary protective mask during the formation of source and drain electrodes. This intermediary layer prevents direct exposure of the pixel electrode to harmful etching processes that would cause haze, while still allowing the pattern to be formed.
4Manufacturing precision
If separate photolithography steps are used for each layer, then manufacturing precision is improved, but the number of process steps increases
Solution Approach 1:
The patent merges the patterning of gate lines, semiconductor layers, and data lines into a single photolithography step. By using one photoresist layer to define all three patterns simultaneously, the process reduces the number of steps while maintaining precision through controlled etching of each layer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the manufacturing process, reduces costs, and improves the aperture ratio of pixels while preventing haze in the pixel electrodes.
Implementation Method 1
applying a plasma process to the exposed semiconductor, after the exposing of the semiconductor between the source electrode and the drain electrode
Data Source
AI summary
A method of manufacturing a liquid crystal display includes: forming a gate line including a gate electrode on a first substrate; forming a gate insulating layer on the gate line; sequentially forming a semiconductor layer, an amorphous silicon layer, and a data metal layer on the entire surface of the gate insulating layer; aligning the edges of the semiconductor layer and the data metal layer; forming a transparent conductive layer on the gate insulating layer and the data metal layer; forming a first pixel electrode and a second pixel electrode by patterning the transparent conductive layer; and forming a data line including a source electrode, a drain electrode, and an ohmic contact layer by etching the data metal layer and the amorphous silicon layer, using the first pixel electrode and the second pixel electrode as a mask, and exposing the semiconductor between the source electrode and the drain electrode.