LED Chip Passivation with Magnesium Oxide and Nitride

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Solution Overview

Problem

Light-emitting diode chips, particularly those based on InGaAlP, suffer from low efficiency due to nonradiative recombinations of charge carriers on etched side surfaces caused by oxygen bonding, leading to intermediate states in the band gap that reduce radiation generation.

Innovation Solution

A passivation layer consisting of magnesium oxide and magnesium nitride is applied to the side surfaces of the epitaxial semiconductor layer sequence, replacing oxygen bonds and promoting nitridation, which reduces intermediate states and enhances radiative recombination by forming indium-nitrogen, aluminum-nitrogen, and gallium-nitrogen bonds.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Shape

If the side surfaces of the epitaxial semiconductor layer sequence are etched, then the shape and structure of the light-emitting diode chip can be defined, but nonradiative recombinations of charge carriers occur on the etched side surfaces due to oxygen bonding, reducing efficiency

Engineering Contradiction:
Improveside surface structureVSAvoidefficiency
Core Design Contradiction:
ShapeVSLoss of energy

Solution Approach 1:

A passivation layer is introduced as an intermediary between the etched side surfaces and the environment. This passivation layer prevents oxygen from bonding to the semiconductor material at the side surfaces, thereby eliminating the harmful intermediate states in the band gap that cause nonradiative recombination, while allowing the etched shape to be maintained

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The passivation layer creates an inert protective environment around the semiconductor side surfaces, isolating them from oxygen in the surrounding atmosphere. This prevents oxidation and the formation of intermediate states that would otherwise lead to energy loss through nonradiative recombination

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly increases the efficiency of light-emitting diode chips, especially those with small lateral extent, by minimizing nonradiative recombinations and maximizing radiative recombination, thereby enhancing radiation output.

Implementation Method 1

bonds with nitrogen are formed on the interface with the epitaxial semiconductor layer sequence instead of the bonds of the compound semiconductor material with oxygen

Methodology Applied
Scientific EffectNitridation: Chemical Bonding

Implementation Method 2

the radiative recombination of charge carriers in the active zone is increased and the efficiency of the light-emitting diode chip is thus increased

Methodology Applied
Scientific EffectRadiative recombination: Electroluminescence

Implementation Method 3

Since magnesium has a higher affinity for oxygen than the elements contained in the compound semiconductor material, exchange of oxygen and nitrogen takes place and bonds with nitrogen are formed on the interface with the epitaxial semiconductor layer sequence

Methodology Applied
Scientific EffectOxygen-nitrogen exchange: Chemical Bonding

Implementation Method 4

the compound semiconductor material is oxidized in the region of the side surface of the semiconductor layer sequence

Methodology Applied
Scientific EffectOxidation: Oxidation

Data Source

PatentUS11107954B2Light-emitting diode chip, and method for manufacturing a light-emitting diode chip
Publication Date: 2021.08.31 AMS OSRAM INT GMBH
  • US11107954B2 patent drawing
  • US11107954B2 patent drawing
  • US11107954B2 patent drawing

AI summary

A light-emitting diode chip that includes an epitaxial semiconductor layer sequence having an active region that generates electromagnetic radiation during operation, and a passivation layer comprising magnesium oxide and magnesium nitride. The passivation layer may be applied to a lateral surface of the semiconductor layer sequence, and the passivation layer covering at least the active region.