Light Emitting Element Insulation for Etch-Safe Quantum Layers
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Solution Overview
Problem
Current light emitting elements face challenges in achieving high emission efficiency and reliability, particularly during the manufacturing process, where risks such as damage to quantum particles can occur due to etching processes, leading to defects and reduced performance.
Innovation Solution
A method of manufacturing a light emitting element involving patterning of growth bases, forming semiconductor layers, and using an insulating layer made of aluminum oxide or silicon-based materials to prevent etching damage, ensuring a crystalline structure and minimizing defects, thereby enhancing emission efficiency and reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If etching process is used to pattern the growth base, then manufacturing precision is improved, but quantum particles may be damaged leading to reduced reliability
Solution Approach 1:
An insulating layer is introduced as an intermediary between the etching process and the quantum particles. This layer physically separates the harmful etching environment from the sensitive quantum structures, allowing precise patterning of the growth base while protecting the quantum particles from damage
Solution Approach 2:
The insulating layer is formed on the growth base before the etching process. This preliminary protective action ensures that when etching occurs to pattern the first and second base areas, the quantum particles are already shielded, preventing damage before it can occur
2Reliability
If insulating layer is formed to protect quantum particles, then reliability is improved, but device complexity increases
Solution Approach 1:
The insulating layer serves multiple functions simultaneously: it protects quantum particles from etching damage, provides electrical insulation between different regions, and serves as a structural foundation for subsequent electrode formation. This multi-functionality reduces the need for additional separate components or processes
3Use of energy by moving object
If growth base is patterned into holes, then emission efficiency is improved, but manufacturing precision may be compromised due to etching risks
Solution Approach 1:
The insulating layer acts as a protective intermediary during the hole formation process. It allows the growth base to be etched into precise hole patterns that improve emission efficiency, while the layer shields the quantum particles within the holes from etching damage that would compromise manufacturing precision
Data Source
AI summary
A method of manufacturing a light emitting element, comprising patterning a first base area of a growth base, forming semiconductor layers, and patterning a portion of a second base area of the growth base, different from the first base area. A resulting light emitting element, and a display device including such a light emitting element are included.