Light Microscopy Guided FIB Micromachining for Beam-Sensitive Samples
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Solution Overview
Problem
Focused Ion Beam (FIB) micromachining of beam-sensitive samples, such as organic materials, often results in artifacts and chemical modifications due to electron beam exposure, making it difficult to produce undamaged samples suitable for high-resolution inspection in electron microscopes.
Innovation Solution
An integrated system combining a FIB exposure system with a light optical microscope allows for non-invasive determination and micromachining of regions of interest, minimizing sample damage by using light microscopy to position and monitor the FIB, enabling the creation of undamaged lamellae for electron microscopy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a FIB is used to machine beam-sensitive samples, then micromachining precision is improved, but sample damage and artifacts are induced by the electron beam
Solution Approach 1:
The patent introduces a light optical microscope as an intermediary imaging system between the user and the sample. This optical microscope allows non-invasive observation and positioning of the sample without using the damaging electron beam, thereby mediating the interaction between the FIB system and the beam-sensitive sample to prevent direct electron beam damage during positioning and monitoring operations
Solution Approach 2:
The patent replaces the electron beam-based imaging and positioning system with a light optical microscope system. This substitution eliminates the harmful electron beam interaction during sample positioning and monitoring, using photons instead of electrons to achieve the same navigational and monitoring functions without inducing chemical modifications or damage to beam-sensitive materials
2Ease of operation
If an electron beam is used to image and position the sample, then navigation and positioning capability is improved, but chemical modifications and decomposition are induced
Solution Approach 1:
The light optical microscope serves as an intermediary system that enables navigation and positioning functions without directly interacting with the sample using a damaging electron beam. It provides real-time optical feedback that allows operators to navigate and position the sample accurately while avoiding electron beam-induced chemical modifications and decomposition
Solution Approach 2:
The patent substitutes the electron beam imaging system with a light optical microscope for navigation and positioning tasks. This replacement uses photon-based optical imaging instead of electron beam interaction, eliminating the generation of harmful reactive species and chemical modifications while maintaining the ability to navigate and position the sample effectively
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise and damage-free micromachining of vulnerable materials, reducing the risk of artifacts and allowing for high-resolution imaging of samples, particularly suitable for Transmission Electron Microscopy.
Implementation Method 1
a light optical microscope, wherein the light optical microscope is configured for imaging or monitoring the sample on the sample holder
Implementation Method 2
a focused ion beam exposure system comprising an assembly for projecting a focused ion beam onto a first position where, in use, the focused ion beam impinges on the sample held by the sample holder
Data Source
AI summary
An apparatus and a method for micromachining samples is provided. The apparatus includes an integral combination of a sample holder, a focused ion beam exposure system for projecting a FIB onto a first position on the sample, and a light optical microscope. The LM is configured for imaging or monitoring said first position. The method includes the steps of capturing LM images of the sample, determining a position and physical dimensions of a region of interest in the sample based on the LM images, establishing from the LM images settings of the sample holder and/or the FIB exposure system, for micromachining the sample to bring the region of interest more closer to the surface, and moving the sample or the trajectory of the FIB to locate the first position on the sample accordingly, and activating the FIB for micromachining the sample.