Lithography Chamber Rib Reinforcement for Lens Tilt Control
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Solution Overview
Problem
The miniaturization of semiconductor devices requires precise pattern formation, but conventional electron beam lithography apparatuses experience errors due to tilt of the electro-optic lens barrel caused by atmospheric pressure variations, leading to positional misalignment and reduced pattern-forming accuracy.
Innovation Solution
A lithography apparatus with a reinforced side surface on the writing chamber, featuring a rib portion to enhance the rigidity of the side surface with an opening, balancing the deformation and reducing the tilt angle of the electro-optic lens barrel, thereby improving pattern accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the opening is closed with a door fixed to the side surface, then the opening can be sealed, but the side surface rigidity is reduced causing chamber deformation and lens barrel tilt
Solution Approach 1:
The patent applies local reinforcement by forming a rib portion specifically at the opening side surface of the chamber, while other side surfaces maintain their original structure. This localized structural modification increases the rigidity of the opening side surface without affecting the overall chamber design, preventing differential deformation and lens barrel tilt when the opening is sealed.
2Manufacturing precision
If the side surface rigidity is increased to prevent deformation, then pattern accuracy is improved, but the chamber structure becomes more complex
Solution Approach 1:
The patent adds a rib portion that extends in the thickness direction of the side surface, utilizing the third dimension to reinforce the opening side surface. This dimensional approach increases structural rigidity and prevents chamber deformation without requiring complex modifications to the chamber's overall geometry or configuration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The rib portion reduces beam displacement and tilt angle, enhancing the writing accuracy and maintaining pattern precision even with atmospheric variations, effectively addressing the issue of positional misalignment.
Implementation Method 1
a rib portion formed to have a shape that is convex on an upper portion of the side surface of the chamber in which the opening is formed
Implementation Method 2
an electro-optic lens barrel arranged on the chamber
Implementation Method 3
the electro-optic lens barrel and the write chamber are vacuumed by a vacuum pump
Data Source
AI summary
A lithography apparatus includes a stage on which a target object is placed; a chamber in which the stage is arranged and which has one side surface in which an opening having a size which is enough to carry the stage in or out is formed, the opening being closed with an independent lid; an electro-optic lens barrel arranged on the chamber; and a rib portion formed to have a shape that is convex on an upper portion of the side surface of the chamber in which the opening is formed.