Lithography Mask With Segmented Optical Filters
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Solution Overview
Problem
Current lithography processes in liquid crystal display manufacturing are limited by the resolution of exposure machines, which restricts the ability to achieve smaller critical dimensions due to inherent defects in exposure accuracy, making it difficult to further improve precision beyond a certain point.
Innovation Solution
A mask with alternating first and second light transmission areas, each equipped with different optical filter films that allow light of specific frequency ranges to pass through, enabling two exposures with distinct frequencies to reduce edge interference and achieve finer patterns by alternating the use of these areas in lithography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a single light transmission area with uniform optical properties is used in the mask, then the lithography process is simple and easy to manufacture, but the minimum feature size is limited by the exposure machine resolution and edge interference effects prevent achieving higher precision
Solution Approach 1:
The mask is divided into multiple light transmission areas (first, second, third, fourth) with different optical filter films, each having different transmittances for first and second wavelengths. This segmentation allows selective exposure of different regions with different wavelengths, enabling formation of fine patterns that overcome the resolution limits of conventional single-wavelength lithography systems.
Solution Approach 2:
Different regions of the mask are assigned different optical properties through the use of distinct optical filter films in each light transmission area. The first light transmission area has high transmittance for first wavelength, the second area has high transmittance for second wavelength, and so on. This local differentiation of optical properties enables precise control over which regions are exposed to which wavelengths, achieving high-resolution patterning.
2Manufacturing precision
If conventional single-wavelength lithography is used, then the exposure process is simple and fast, but edge interference effects limit the achievable pattern precision and minimum feature size
Solution Approach 1:
The lithography process uses periodic alternation between first wavelength exposure and second wavelength exposure. The mask alternates between allowing first wavelength to pass through certain areas and second wavelength to pass through other areas. This periodic switching between different wavelengths enables the formation of complex patterns while reducing edge interference effects that would occur with single-wavelength exposure.
Solution Approach 2:
Optical filter films serve as intermediaries between the light source and the photoresist. These filter films selectively transmit or block specific wavelengths in different regions of the mask, mediating the exposure process to achieve precise pattern formation while minimizing edge interference. The filter films enable independent control of first and second wavelength exposure in different areas.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for the reduction of minimum feature sizes below the limitations of traditional exposure machines, achieving higher precision and reducing edge interference effects, thereby enabling the production of highly fine slit structures and improving light transmittance in display panels.
Implementation Method 1
the first optical filter film and the second optical filter film comprise respective materials through which light of different frequency ranges is optically filtered, respectively
Data Source
AI summary
A mask is provided in embodiments of the disclosure, at least including: a first light transmission area provided with a first optical filter film; and a second light transmission area provided with a second optical filter film; the first optical filter film and the second optical filter film comprise respective materials through which light of different frequency ranges is optically filtered, respectively. A method for manufacturing a mask, a lithography method, a display panel, a display device, and an exposure device are further provided in embodiments of the disclosure.