Load Lock Shield Plate and Bottom Seal for Particle Reduction
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Solution Overview
Problem
Charged particle beam inspection systems face contamination issues due to particles from components in the load lock system, which reduce the yield and reliability of semiconductor devices, especially in high integration levels and nano-scale manufacturing.
Innovation Solution
A load lock system with a particle shield plate and a bottom seal plate, along with non-contact or contact position detecting units, is used to shield and position samples effectively, reducing contamination by isolating potential sources and minimizing contact within the vacuum environment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If components such as cable, contact detecting units, and screws are used in the load lock system for signal transduction and positioning, then the operational functionality and positioning accuracy are improved, but contamination particles are generated that reduce semiconductor device yield and reliability
Solution Approach 1:
The patent extracts and removes potential contamination sources (cables, contact detecting units, screws) from the load lock system. The design eliminates these components entirely, using a cable-free, contactless positioning system with no fastening elements that could generate particles, thereby solving the contradiction between operational functionality and contamination prevention
Solution Approach 2:
The patent introduces an intermediary magnetic field-based positioning system that replaces direct physical contact between components. The contactless position detecting unit uses magnetic fields as an intermediary to detect wafer position without physical contact, eliminating particle generation from mechanical components while maintaining positioning accuracy
2Adaptability or versatility
If multiple components are installed in the load lock system to enable signal transduction and positioning detection, then the operational capability is improved, but the complexity of the system increases
Solution Approach 1:
The patent extracts and removes multiple complex components (cables, contact detecting units, screws) from the system. The simplified design achieves the same operational capability through a contactless position detecting unit that requires no physical connections or fastening elements, thereby reducing system complexity while maintaining adaptability
Solution Approach 2:
The patent implements a universal load lock chamber design that can accommodate different wafer sizes and types without requiring additional components. The contactless position detecting unit and magnetic field-based system provide multi-functional capability for positioning and detection across various wafer configurations, reducing the need for specialized components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system significantly reduces contamination particles, enhancing the reliability and yield of semiconductor devices by effectively shielding undesired particles and improving the accuracy of nano-scale inspections.
Implementation Method 1
a particle shield plate disposed above the sample for shielding from at least one undesired particle from at least one component coupled with the apparatus
Implementation Method 2
at least one position detecting unit with an emitter for projecting a light beam on the sample and a receiver for receiving the reflected signal form the sample to identify the position of the sample
Data Source
AI summary
A load lock system for charged particle beam imaging with a particle shielding plate, a bottom seal plate and a plurality of sensor units is provided. The sensor units are located above the wafer, the shield plate is designed to have a few number of screws, and the bottom seal plate contains no cable, no contact sensors and fewer screws used. In the invention, the system is designed to improve the contamination particles from components in the load lock system of charged particle beam inspection tool and also to simplify its assembly.