Lock Mechanism Prevents Dust Contamination in Substrate Processing
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Solution Overview
Problem
Conventional substrate processing apparatuses face contamination issues due to dust generated by the rubbing of mechanical components near the opening, which contaminates the substrate during high-pressure processing.
Innovation Solution
A lock mechanism with an arm member and locking member that moves between closed and separated positions, ensuring the arm member and locking member engagement is outside the gap space, preventing dust from entering the processing chamber and maintaining airtightness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a lock mechanism with rubbing members is used to reliably fix the processing container body and lid, then airtightness is maintained and the lid is prevented from opening due to internal pressure, but fine powder generated by rubbing scatters and adheres to the substrate conveyance path and opening, causing substrate contamination
Solution Approach 1:
The lock mechanism is segmented into two functional zones: a rubbing zone where the arm member and locking member engage to maintain airtightness, and a clean zone where the substrate conveyance path is located. The arm member extends beyond the opening in the separated position to position the rubbing interface away from the opening, effectively separating the harmful rubbing activity from the clean substrate area.
Solution Approach 2:
The arm member acts as an intermediary element that transmits the locking force from the locking member to the lid while extending beyond the opening. This intermediary structure allows the rubbing to occur at a location (beyond the gap space) that does not directly contaminate the substrate conveyance path, mediating between the need for reliable locking and the need for substrate cleanliness.
2Reliability
If the lid is positioned close to the processing container body to ensure airtightness, then pressure containment is improved, but mechanical components must operate in close proximity generating dust that can contaminate the substrate
Solution Approach 1:
The problem is solved by transitioning from a two-dimensional planar arrangement to a three-dimensional spatial arrangement. The arm member extends in the direction perpendicular to the lid surface (beyond the opening), creating a spatial separation between the rubbing interface and the opening plane. This dimensional change allows the locking mechanism to maintain effectiveness while removing the dust generation zone from the critical substrate area.
Data Source
AI summary
A substrate processing system includes a processing container body having an opening, a lid which closes an opening, a mover for relatively moving the lid with respect to the opening to open and close the opening, and a lock mechanism which locks the lid to the processing container body. The lock mechanism includes an arm member and a locking member. The arm member is provided on one of the processing container body and the lid and extends toward the other when the processing container body is located at a position where the lid is separated from the processing container body. The locking member restricts a displacement of the arm member by being engaged with a part of the arm member. This part is located beyond the gap space when the lid is at the separated position.