Magnetic Force Applying Unit for Substrate Moving in Deposition
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Solution Overview
Problem
The challenge in manufacturing large organic light-emitting display devices is the difficulty in accurately depositing materials due to the bending of large fine metal masks and the time-consuming process of aligning and separating them from substrates, leading to low production efficiency.
Innovation Solution
A substrate moving unit with an electrostatic chuck and a magnetic force applying unit is used, which includes a patterning slit sheet that moves relative to the substrate, allowing for precise deposition without direct contact and minimizing bending issues, utilizing an electrostatic chuck with buffer surfaces and dummy substrates to stabilize the patterning slit sheet.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a large fine metal mask is used for manufacturing large organic light-emitting display apparatus, then the substrate area increases, but the mask bends due to its own weight making it difficult to form precise patterns
Solution Approach 1:
The patent replaces the mechanical contact system (FMM physically touching substrate) with a magnetic field-based system. The magnetic force applying unit generates a magnetic field that applies force to the patterning slit sheet non-contactually, eliminating the need for mechanical support structures that cause bending. This allows large-area substrates to be processed without mask deformation.
Solution Approach 2:
The patent changes the physical state and interaction parameters by using magnetic fields instead of mechanical contact. The magnetic force applying unit generates controlled magnetic flux density distributions that can dynamically adjust the positioning and tension of the patterning slit sheet, preventing bending while maintaining pattern precision across large substrate areas.
2Area of stationary object
If a large fine metal mask is used to cover the entire substrate, then complete coverage is achieved, but the alignment and separation processes become time-consuming
Solution Approach 1:
The patent replaces mechanical alignment and separation operations with magnetic field control. The magnetic force applying unit can rapidly adjust the position and orientation of the patterning slit sheet without physical handling, and can quickly release the mask from the substrate by turning off or reversing the magnetic field, dramatically reducing cycle time.
Solution Approach 2:
The patent introduces dynamic control through the magnetic force applying unit, which can real-time adjust the positioning and tension of the patterning slit sheet during the deposition process. This dynamic adjustment capability eliminates the need for slow, static alignment procedures and rapid mechanical separation operations.
3Manufacturing precision
If the patterning slit sheet is positioned close to the substrate for precise deposition, then deposition accuracy improves, but the sheet may bend due to gravitational and magnetic forces
Solution Approach 1:
The patent uses the magnetic force applying unit to generate counteracting magnetic forces that balance the gravitational force and any attractive forces pulling the patterning slit sheet toward the substrate. By carefully controlling the magnetic field strength and distribution, the sheet is held in a stable, bent-free position at the optimal deposition distance.
Solution Approach 2:
The patent dynamically adjusts magnetic field parameters (strength, distribution, direction) to maintain the patterning slit sheet in a stable configuration. By changing magnetic flux density parameters, the system can compensate for gravitational effects and keep the sheet flat and positioned precisely for accurate material deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate and efficient deposition on large substrates by preventing the patterning slit sheet from bending and maintaining non-contact alignment, thereby increasing production speed and reducing errors in pattern formation.
Implementation Method 1
an electrostatic chuck configured to fix a substrate on a first surface
Implementation Method 2
a magnetic force applying unit disposed on a second surface of the electrostatic chuck
Data Source
AI summary
Provided are a substrate moving unit for use with a deposition apparatus that allows a deposition material to be precisely deposited on a target site of a substrate. The substrate moving unit includes an electrostatic chuck having a first surface on which a substrate is fixable and a magnetic force applying unit disposed on a second surface of the electrostatic chuck. A deposition apparatus including the substrate moving unit, a method of manufacturing an organic light-emitting display apparatus, and an organic light-emitting display apparatus manufactured by using the method are also presented.