Magnetic Write Pole Sidewall Angle Profile Fabrication
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Solution Overview
Problem
Conventional magnetic recording heads face limitations in performance at higher recording densities due to insufficient write field magnitude, which affects their ability to meet specific standards.
Innovation Solution
A method involving the fabrication of a magnetic recording apparatus with a main pole having varying sidewall angles, achieved through the use of an intermediate layer with etchable sublayers and reactive ion etching, allows for the enhancement of the magnetic field and reduction of adjacent track interference.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Force
If conventional main pole structure is used, then manufacturing is simpler, but write field magnitude is insufficient for higher recording densities
Solution Approach 1:
The patent applies local quality by creating a main pole with non-uniform sidewall angles - the sidewalls have different angles at different heights. Specifically, the lower portion of the main pole has a first sidewall angle while the upper portion has a second sidewall angle that is more acute. This local variation in geometry optimizes the magnetic field distribution - the wider lower portion generates stronger write field magnitude while the narrower upper portion concentrates the field at the pole tip, resolving the contradiction between field strength and structural complexity.
2Force
If main pole sidewalls are made more acute, then write field magnitude increases, but adjacent track interference increases
Solution Approach 1:
The patent resolves this contradiction by applying local quality through segmented sidewall angles. The lower portion of the main pole maintains a less acute sidewall angle that confines the magnetic field laterally, reducing adjacent track interference. The upper portion transitions to a more acute angle that concentrates the field vertically at the pole tip, maintaining high write field magnitude. This localized geometric optimization allows both goals to be achieved simultaneously in different spatial regions.
3Manufacturing precision
If intermediate layer with etchable sublayers is used, then sidewall angle control is improved, but manufacturing process complexity increases
Solution Approach 1:
The patent applies segmentation by dividing the intermediate layer into multiple etchable sublayers with different etch selectivities. Each sublayer can be selectively removed to define different sidewall angles at different heights of the main pole. This segmentation enables precise control of the complex non-uniform sidewall profile through sequential etching processes, resolving the contradiction between manufacturing precision and process complexity by breaking down the complex shaping task into manageable sequential steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method improves the magnetic field strength and gradient, enhancing the write performance of the magnetic recording head while maintaining side field stability, thereby increasing the magnetic volume and reducing domain lockup issues.
Implementation Method 1
reactive ion etching
Data Source
AI summary
A method provides a magnetic device having an air-bearing surface (ABS) location. A layer including first and second sublayers is provided. The first sublayer includes the ABS location. The second sublayer recessed from the ABS location such that part of the first sublayer is between the second sublayer and the ABS location. The first sublayer has a rear surface oriented at a nonzero, acute angle from a surface perpendicular to the ABS location. A trench is formed in the layer. The trench has a bottom, a top and sidewalls. The sidewalls form a first angle with a direction perpendicular to the bottom at the ABS location. The sidewalls form a second angle with the direction in part of the second sublayer. The second angle is smaller than the first angle. The sidewall angle varies along the rear surface of the first sublayer. A main pole is provided in the trench.