Mandrel Mask Design for FinFET Layouts
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Solution Overview
Problem
As semiconductor device fabrication processes miniaturize, there is a growing need for small-size semiconductor device layouts that can achieve scale reduction and reliability, particularly in standard cell design, where existing methods struggle to efficiently design and align mandrel mask patterns for fin structures.
Innovation Solution
A layout design method that involves generating dummy fin designs and mandrel candidate designs based on predetermined values, decomposing these into first and second mandrel mask designs, and selecting one that satisfies a predetermined condition to create a final mandrel mask design, ensuring proper alignment and reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If semiconductor device fabrication processes are miniaturized to achieve smaller device size, then device scale is reduced, but layout design complexity and difficulty increase
Solution Approach 1:
The layout design process is segmented into distinct stages: receiving normal fin designs, generating dummy fin designs, creating mandrel candidate designs, decomposing into mandrel mask designs, and selecting the final design. This segmentation allows complex miniaturization tasks to be broken down into manageable steps, reducing overall design complexity while enabling continued scale reduction.
Solution Approach 2:
Dummy fin designs are generated in advance before creating the final mandrel mask design. These dummy fins serve as preliminary structures that guide subsequent design steps, allowing the system to pre-establish critical dimensions and spacing requirements before finalizing the actual device layout, thereby managing complexity during miniaturization.
2Adaptability or versatility
If multiple normal fin designs with different interval distances are used, then design flexibility increases, but mandrel mask generation difficulty increases
Solution Approach 1:
The system applies different interval distances and dummy fin configurations to specific local regions based on the normal fin designs provided. Each region receives customized dummy fin generation parameters tailored to its specific spacing requirements, allowing the system to handle diverse fin designs while maintaining automated mandrel mask generation through localized parameter adjustment.
3Productivity
If automated dummy fin design generation is implemented, then productivity increases, but design precision requirements increase
Solution Approach 1:
The system incorporates feedback mechanisms where the generated dummy fin designs are evaluated against predetermined conditions and design rules. The automated generation process continuously adjusts parameters based on feedback from design validation checks, ensuring that productivity gains from automation do not compromise the precision required for reliable mandrel mask generation.
Data Source
AI summary
A layout design method may include receiving predetermined values related to first to third normal fin designs extending in a first direction and arranged in parallel in a second direction perpendicular to the first direction, generating dummy fin designs based on the predetermined values, generating mandrel candidate designs based on the first to third normal fin designs and the dummy fin designs, decomposing the mandrel candidate designs to first and second mandrel mask designs, and generating a final mandrel mask design using one of the first and second mandrel mask designs that satisfies a predetermined condition. A first interval distance in the second direction between the first normal fin design and the second normal fin design may be different from a second interval distance in the second direction between the second normal fin design and the third normal fin design.