Mask Frame Assembly for High-Resolution OLED Shadow Effect Reduction
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Solution Overview
Problem
High-resolution organic light-emitting displays face issues with shadow effects due to high-incident-angle molecules during manufacturing, leading to low-quality displays with unintended shadowing.
Innovation Solution
A mask frame assembly is designed with a frame, a first mask, and second masks that include pattern parts and rib parts with dummy holes, allowing deposition materials to pass through while blocking foreign materials, thereby preventing the lifting phenomenon and ensuring precise deposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If typical vacuum deposition techniques are used for manufacturing high-resolution organic light emitting displays, then the manufacturing process is simple and cost-effective, but the display quality deteriorates due to large shadow effects from high-incident-angle molecules
Solution Approach 1:
The mask structure is divided into multiple components: a frame, a first mask with second openings, and second masks with pattern parts and rib parts. This segmentation allows each component to perform its specific function - the first mask defines the overall deposition area while the second masks create precise patterns, collectively reducing shadow effects and improving display quality without complicating the overall manufacturing process
2Manufacturing precision
If the first mask has second openings with area smaller than the first opening, then the deposition precision is improved, but the amount of deposition material passing through is reduced
Solution Approach 1:
The patent introduces a multi-layer mask structure where the first mask and second masks operate at different spatial levels. The first mask with smaller second openings provides precise positioning, while the second masks with pattern parts and rib parts containing dummy holes allow additional material flow paths. This dimensional arrangement maintains deposition precision while compensating for material quantity reduction through the dummy holes in the rib parts
3Reliability
If dummy holes with area greater than pattern holes are formed in the rib part, then foreign materials are blocked and lifting phenomenon is prevented, but the mask structure complexity increases
Solution Approach 1:
The dummy holes are strategically placed only in the rib parts of the second masks, not throughout the entire mask structure. This localized approach provides the necessary foreign material blocking and lifting prevention capabilities at critical stress points while maintaining simplicity in other areas of the mask, thus balancing reliability with structural complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces defects caused by foreign materials and minimizes shadow effects, resulting in high-quality, high-resolution organic light-emitting displays by ensuring precise deposition during the manufacturing process.
Implementation Method 1
forming on an organic film and/or an electrode via vacuum deposition
Implementation Method 2
result in a low quality organic light emitting display with a large shadow effect (i.e., unintended excessive shadowing due to high-incident-angle molecules relative the normal angle)
Data Source
AI summary
A mask frame assembly including a frame including a first opening, a first mask including second openings that each has an area smaller than the first opening and a first surface having portions of the first surface connected to the frame. The mask frame assembly includes second masks disposed on a second surface of the first mask extending across the first opening in a first direction and arranged in a second direction that is substantially perpendicular. The second masks include pattern parts having a shape corresponding to the second openings. The pattern parts each include pattern holes configured to allow a deposition material to pass through. The second masks include a rib part disposed between the pattern parts. The rib part includes dummy holes each having an area greater than each of the pattern holes. The first mask is configured to block the deposition material passing through the dummy holes.